公开(公告)号：US20190010430A1

公开(公告)日：2019-01-10

申请号：US16028720

申请日：2018-07-06

Applicant: SEMES CO., LTD.

Inventor： MONG-RYONG LEE ,  MIYOUNG JO ,  YERIM YEON ,  ANTON KORIAKIN

IPC: C11D11/00 ,  C11D17/00 ,  C11D3/37 ,  C11D3/43

CPC classification number: C11D11/0047 ,  C11D3/37 ,  C11D3/3707 ,  C11D3/378 ,  C11D3/43 ,  C11D17/0013

Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating method includes applying a treatment liquid containing a monomeric substance to a substrate that is intended to be cleaned, curing the treatment liquid with a cleaning film by irradiating light to the treatment liquid and polymerizing the monomeric substance, and removing the cleaning film.