公开(公告)号：US20190057884A1

公开(公告)日：2019-02-21

申请号：US16102812

申请日：2018-08-14

Applicant: SEMES CO., LTD.

Inventor： MINHEE CHO ,  JAEHYEOK YU ,  SEHOON OH ,  TAE-KEUN KIM ,  YERIM YEON ,  HAE RIM OH ,  JI SOO JEONG

IPC: H01L21/67 ,  H01L21/02

Abstract: Disclosed are relate to an apparatus for supplying a cleaning liquid to a substrate. The cleaning liquid supply unit includes a mixing container having a liquid mixing space in the interior thereof, a first supply member configured to supply a first liquid into the liquid mixing space, a second supply member configured to supply a second liquid that is different from the first liquid into the liquid mixing space, and a mixing member configured to mix the first liquid and the second liquid supplied into the liquid mixing space, and the mixing member may include a circulation line, through which the liquids in the liquid mixing space circulate, and a pressure adjusting member configured to provide a pressure to the liquids such that the liquids in the liquid mixing space flows into the circulation line and adjust the pressure.

公开(公告)号：US20190010430A1

公开(公告)日：2019-01-10

申请号：US16028720

申请日：2018-07-06

Applicant: SEMES CO., LTD.

Inventor： MONG-RYONG LEE ,  MIYOUNG JO ,  YERIM YEON ,  ANTON KORIAKIN

IPC: C11D11/00 ,  C11D17/00 ,  C11D3/37 ,  C11D3/43

CPC classification number: C11D11/0047 ,  C11D3/37 ,  C11D3/3707 ,  C11D3/378 ,  C11D3/43 ,  C11D17/0013

Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating method includes applying a treatment liquid containing a monomeric substance to a substrate that is intended to be cleaned, curing the treatment liquid with a cleaning film by irradiating light to the treatment liquid and polymerizing the monomeric substance, and removing the cleaning film.