公开(公告)号：US11380560B2

公开(公告)日：2022-07-05

申请号：US16396982

申请日：2019-04-29

Applicant: SEMES CO., LTD.

Inventor： Ki Seung Lee ,  Choongki Min ,  Soo Hyun Cho ,  Okseong Lee

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687

Abstract: The inventive concept relates to an apparatus and method for forming a film on a substrate by spin coating. The apparatus includes liquid dispensing units that dispense processing liquids to form liquid films on the first and second substrates, respectively, air-flow supply units that form downward air flows in the first and second spaces, respectively, and a controller that controls the liquid dispensing units and the air-flow supply units. Each of the liquid dispensing units includes a pre-treatment nozzle that dispenses a pre-treatment liquid and a coating solution nozzle that dispenses a coating solution onto a corresponding one of the first and second substrates. The controller controls the liquid dispensing units to dispense the pre-treatment liquids and thereafter the coating solutions onto the first and second substrates and adjusts supply states of the downward air flows according to amounts of the pre-treatment liquids dispensed.