公开(公告)号：US20130284209A1

公开(公告)日：2013-10-31

申请号：US13873516

申请日：2013-04-30

Applicant: SEMES CO., LTD.

Inventor： YU HWAN KIM ,  BYUNG MAN KANG ,  SE HOON OH ,  YEON JOON KIM

IPC: B08B3/10

CPC classification number: B08B3/10 ,  H01L21/67028 ,  H01L21/67051

Abstract: The substrate cleaning apparatus includes a first process chamber in which a liquid treating process is performed on a substrate by supplying a treating solution, a second process chamber in which a drying process is performed on the substrate, and a carrying unit carrying the substrate between the first process chamber and the second process chamber. The first process chamber includes a liquid treating housing providing a space in which the liquid treating process is performed on the substrate, a spin chuck supporting the substrate within the liquid treating housing, and a liquid supply member supplying the treating solution onto the substrate supported by the spin chuck. The second process chamber includes a drying housing providing a space in which the substrate is dried, a substrate support member supporting the substrate within the drying housing, and a heater heating the substrate.

Abstract translation: 基板清洗装置包括：第一处理室，其中通过提供处理溶液在基板上进行液体处理工艺;在基板上执行干燥处理的第二处理室;以及承载基板的承载单元， 第一处理室和第二处理室。 第一处理室包括：液体处理壳体，其在衬底上提供液体处理过程，在液体处理壳体内支撑衬底的旋转卡盘;以及将处理溶液供给到由 旋转卡盘。 第二处理室包括干燥壳体，其提供基板被干燥的空间，在干燥壳体内支撑基板的基板支撑构件和加热基板的加热器。