公开(公告)号：US11491781B2

公开(公告)日：2022-11-08

申请号：US17337966

申请日：2021-06-03

Applicant: SEMES CO., LTD.

Inventor： Su Beom Jeon

IPC: B41J2/04 ,  B41J2/045 ,  B41J2/145

Abstract: A head alignment apparatus for determining a reference position using position synchronization and aligning a plurality of head modules according to the reference position, and a substrate treating system including the same are provided. The head alignment apparatus may include, a reference position determining unit for determining a first reference position of a head transfer, in which a plurality of inkjet head modules are installed; and a mounting position determining unit for determining a second reference position of the inkjet head module based on the first reference position so that the inkjet head module can be moved from a current position to a second reference position, wherein the reference position determining unit determines a first reference position using a first image sensor installed on the same plane as the inkjet head module and a second image sensor installed facing the inkjet head module.

公开(公告)号：US12118251B2

公开(公告)日：2024-10-15

申请号：US17985378

申请日：2022-11-11

Applicant: SEMES CO., LTD.

Inventor： Kang Young Seo ,  Sung Su Kim ,  Su Beom Jeon

IPC: G06F3/12 ,  G06K15/02 ,  G06K15/10

CPC classification number: G06F3/1205 ,  G06F3/1253 ,  G06F3/126 ,  G06F3/1267 ,  G06K15/021 ,  G06K15/102 ,  G06F3/12

Abstract: A multi-model printing method capable of increasing the freedom of printing and evaluating process for each cell is provided. The multi-model printing method comprises registering a first job for inkjet printing a first cell of a first size in a first region of a glass substrate, registering a second job for inkjet printing a second cell of a second size different from the first size in a second region of the glass substrate, and storing a recipe including the first job and the second job.

公开(公告)号：US20210387450A1

公开(公告)日：2021-12-16

申请号：US17337966

申请日：2021-06-03

Applicant: SEMES CO., LTD.

Inventor： Su Beom Jeon

IPC: B41J2/045 ,  B41J2/145

Abstract: A head alignment apparatus for determining a reference position using position synchronization and aligning a plurality of head modules according to the reference position, and a substrate treating system including the same are provided. The head alignment apparatus may include, a reference position determining unit for determining a first reference position of a head transfer, in which a plurality of inkjet head modules are installed; and a mounting position determining unit for determining a second reference position of the inkjet head module based on the first reference position so that the inkjet head module can be moved from a current position to a second reference position, wherein the reference position determining unit determines a first reference position using a first image sensor installed on the same plane as the inkjet head module and a second image sensor installed facing the inkjet head module.