公开(公告)号：US20250140534A1

公开(公告)日：2025-05-01

申请号：US18826150

申请日：2024-09-05

Applicant: SEMES CO., LTD.

Inventor： Young Seo AN ,  Sang Man PARK ,  Han Lim KANG ,  In Hoe KIM ,  Yoon Seok CHOI ,  Sung Suk WI ,  Tae Hun KANG

IPC: H01J37/32

Abstract: Disclosed are a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a chamber including a processing space defined therein, a substrate support unit configured to support a substrate in the processing space, a microwave unit configured to supply microwaves to the processing space, a window member disposed below the microwave unit and configured to transmit the microwaves supplied from the microwave unit, a heat transfer plate disposed in the processing space so as to be spaced a predetermined distance from the window member and configured to be heated by the microwaves supplied to the processing space and to transfer heat to the substrate, and a controller configured to control the microwave unit.