公开(公告)号：US20220205090A1

公开(公告)日：2022-06-30

申请号：US17564285

申请日：2021-12-29

Applicant: SEMES CO., LTD.

Inventor： Ju Won KIM ,  Yang Yeol RYU ,  Hee Man AHN ,  Jun Ho SEO ,  Dong Woon PARK ,  Sang Pil YOON

IPC: C23C16/44 ,  H01L21/687 ,  H01L21/67

Abstract: An apparatus for processing a substrate includes a first processing unit configured to have a first processing container having a first inner space and a first support unit supporting and rotating the substrate in the first inner space; a second processing unit configured to have a second processing container having a second inner space and a second support unit supporting and rotating the substrate in the second inner space; an exhaust unit configured to exhaust the first and the second inner space; a first exhaust pipe configured to have a first exhaust port for introducing atmosphere of the first inner space and exhaust the atmosphere introduced through the first exhaust port to the integrated duct; and a second exhaust pipe configured to have a second exhaust port for introducing atmosphere of the second inner space and exhaust the atmosphere introduced through the second exhaust port to the integrated duct.