公开(公告)号：US20210008606A1

公开(公告)日：2021-01-14

申请号：US16924633

申请日：2020-07-09

Applicant: SEMES CO., LTD.

Inventor： Inhwang PARK ,  Gui Su PARK ,  Young Hun LEE ,  Youngseop CHOI ,  Seung Hoon OH ,  Jonghyeon WOO ,  Jin Mo JAE

IPC: B08B7/00 ,  H01L21/67

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

公开(公告)号：US20210202271A1

公开(公告)日：2021-07-01

申请号：US17137181

申请日：2020-12-29

Applicant: SEMES CO., LTD.

Inventor： Youngseop CHOI ,  Young Hun LEE ,  Jinwoo JUNG ,  Miso PARK

IPC: H01L21/67 ,  B08B3/08 ,  B08B3/10 ,  B08B7/00 ,  B08B13/00

Abstract: Embodiments of the inventive concept provide an apparatus for treating a substrate. According to an exemplary embodiment, an apparatus for treating a substrate comprises a first valve and a second valve sequentially installed along a direction from a fluid supplying source to a high-pressure chamber in the supply line; a branch line branching from the supply line between the first valve and the second valve and connected to an exhaust line; a third valve installed on the branch line; an exhaust unit exhausting the process fluid inside the high-pressure chamber; and a controller, wherein the controller is configured to perform, before a transfer robot transfers the substrate to the high-pressure chamber for treating the substrate, a first operating of opening the first valve and closing the second valve and a third valve, and a second operating of closing the first valve and the second valve, and opening the third valve.