SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE
    1.
    发明申请
    SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE 有权
    半导体器件和电子器件

    公开(公告)号:US20160284858A1

    公开(公告)日:2016-09-29

    申请号:US15081129

    申请日:2016-03-25

    CPC classification number: H01L29/7869 H01L29/42392 H01L29/78696

    Abstract: To provide a miniaturized transistor having highly stable electrical characteristics. Furthermore, also in a semiconductor device including the transistor, high performance and high reliability are achieved. The transistor includes, over a substrate, a conductor, an oxide semiconductor, and an insulator. The oxide semiconductor includes a first region and a second region. The resistance of the second region is lower than that of the first region. The entire surface of the first region in the oxide semiconductor is surrounded in all directions by the conductor with the insulator interposed therebetween.

    Abstract translation: 提供具有高度稳定的电气特性的小型化晶体管。 此外,在包括晶体管的半导体器件中,也实现了高性能和高可靠性。 晶体管包括在衬底上的导体,氧化物半导体和绝缘体。 氧化物半导体包括第一区域和第二区域。 第二区域的电阻低于第一区域的电阻。 氧化物半导体中的第一区域的整个表面通过绝缘体插入其间的导体被所有方向包围。

    SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE
    2.
    发明申请

    公开(公告)号:US20180090618A1

    公开(公告)日:2018-03-29

    申请号:US15823680

    申请日:2017-11-28

    CPC classification number: H01L29/7869 H01L29/42392 H01L29/78696

    Abstract: To provide a miniaturized transistor having highly stable electrical characteristics. Furthermore, also in a semiconductor device including the transistor, high performance and high reliability are achieved. The transistor includes, over a substrate, a conductor, an oxide semiconductor, and an insulator. The oxide semiconductor includes a first region and a second region. The resistance of the second region is lower than that of the first region. The entire surface of the first region in the oxide semiconductor is surrounded in all directions by the conductor with the insulator interposed therebetween.

    SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE
    3.
    发明公开

    公开(公告)号:US20240113230A1

    公开(公告)日:2024-04-04

    申请号:US18530404

    申请日:2023-12-06

    CPC classification number: H01L29/7869 H01L29/42392 H01L29/78696

    Abstract: To provide a miniaturized transistor having highly stable electrical characteristics. Furthermore, also in a semiconductor device including the transistor, high performance and high reliability are achieved. The transistor includes, over a substrate, a conductor, an oxide semiconductor, and an insulator. The oxide semiconductor includes a first region and a second region. The resistance of the second region is lower than that of the first region. The entire surface of the first region in the oxide semiconductor is surrounded in all directions by the conductor with the insulator interposed therebetween.

    SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE
    4.
    发明申请

    公开(公告)号:US20180331229A1

    公开(公告)日:2018-11-15

    申请号:US16030928

    申请日:2018-07-10

    CPC classification number: H01L29/7869 H01L29/42392 H01L29/78696

    Abstract: To provide a miniaturized transistor having highly stable electrical characteristics. Furthermore, also in a semiconductor device including the transistor, high performance and high reliability are achieved. The transistor includes, over a substrate, a conductor, an oxide semiconductor, and an insulator. The oxide semiconductor includes a first region and a second region. The resistance of the second region is lower than that of the first region. The entire surface of the first region in the oxide semiconductor is surrounded in all directions by the conductor with the insulator interposed therebetween.

    SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE

    公开(公告)号:US20230093689A1

    公开(公告)日:2023-03-23

    申请号:US17990855

    申请日:2022-11-21

    Abstract: To provide a miniaturized transistor having highly stable electrical characteristics. Furthermore, also in a semiconductor device including the transistor, high performance and high reliability are achieved. The transistor includes, over a substrate, a conductor, an oxide semiconductor, and an insulator. The oxide semiconductor includes a first region and a second region. The resistance of the second region is lower than that of the first region. The entire surface of the first region in the oxide semiconductor is surrounded in all directions by the conductor with the insulator interposed therebetween.

    SEMICONDUCTOR DEVICE
    6.
    发明申请

    公开(公告)号:US20210367078A1

    公开(公告)日:2021-11-25

    申请号:US16975309

    申请日:2019-02-21

    Abstract: A semiconductor device in which an electrification phenomenon that leads to characteristic fluctuations, element deterioration, abnormality in shape, or dielectric breakdown is inhibited is provided.
    The semiconductor device includes a first region and a second region over the same plane. The first region includes a transistor. The second region includes a dummy transistor. The transistor includes a first wiring layer, a semiconductor layer including an oxide and provided above the first wiring layer, a second wiring layer provided above the semiconductor layer, and a third wiring layer provided above the second wiring layer. The dummy transistor has the same area as one or more selected from the first wiring layer, the second wiring layer, the semiconductor layer, and the third wiring layer.

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