公开(公告)号：US20240302099A1

公开(公告)日：2024-09-12

申请号：US18583578

申请日：2024-02-21

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Junji ISHIHARA ,  Hisaaki MIYASAKO ,  Yukinobu NISHIBE

IPC: F26B25/00 ,  B08B9/20 ,  F26B3/02

CPC classification number: F26B25/003 ,  B08B9/20 ,  F26B3/02 ,  B08B2209/08

Abstract: According to one embodiment of the present disclosure, a wafer storage container drying apparatus includes a drying tank for drying a wafer storage container that has a storage space connected to an opening and configured to store a wafer, and includes a body including a flange gripped by a robot, and a door installed to be openable and closable with respect to the opening, wherein the drying tank includes a carrying-in/out port configured to be openable and closable by an opening and closing cover, a body receiver configured to receive the body of the wafer storage container in a state where the flange faces the carrying-in/out port; and a door holder configured to hold the door such that each side of the door is neither orthogonal nor parallel to one side that forms the carrying-in/out port, when the drying tank is viewed in a plan view.

公开(公告)号：US20240091828A1

公开(公告)日：2024-03-21

申请号：US18369002

申请日：2023-09-15

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Junji ISHIHARA ,  Katsuhiro YAMAZAKI ,  Hisaaki MIYASAKO ,  Yukinobu NISHIBE

IPC: B08B9/08 ,  B08B9/20 ,  B08B9/46

CPC classification number: B08B9/0813 ,  B08B9/20 ,  B08B9/46 ,  B08B2209/08

Abstract: According to an embodiment of the present disclosure, the cleaning apparatus includes a cleaning tank body having a body opening and a cleaning space; a lid provided to be openable and closable with respect to the body opening; a mounting stage provided in the cleaning space placing a shell of a wafer storage container; a first ejector that ejects a cleaning liquid into a storage space of the shell; a second ejector that ejects the cleaning liquid into an outer portion of the shell; a first discharge port that discharges the cleaning liquid ejected into the storage space of the shell; a second discharge port that discharges the cleaning liquid that has passed through the outer portion of the shell; and a particle counter that measures particles in the cleaning liquid discharged by the first discharge port.

公开(公告)号：US20250108415A1

公开(公告)日：2025-04-03

申请号：US18897797

申请日：2024-09-26

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Junji ISHIHARA ,  Hisaaki MIYASAKO ,  Yukinobu NISHIBE

IPC: B08B9/28 ,  B65G47/90 ,  H01L21/673

Abstract: According to one embodiment of the present disclosure, a wafer storage container cleaning apparatus includes a cleaning chamber that cleans a wafer storage container. The cleaning chamber includes: a chamber that accommodates a shell of the wafer storage container, and capable of being opened and closed by an opening/closing lid via a hinge; a door holder that holds the door; a cleaning nozzle that supplies a cleaning liquid to the shell and the door; a rotation mechanism that rotates the shell and the door; a circular frame that surrounds an outside of the door and has a height that covers a part of the thickness of the door; and an inclined cover that is provided to be inclined such that an end opposite the hinge is the lowest and is higher toward the circular frame, and guides the cleaning liquid supplied to the door and scattered thereon.

公开(公告)号：US20240328713A1

公开(公告)日：2024-10-03

申请号：US18612598

申请日：2024-03-21

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yukinobu NISHIBE ,  Toshihiro HAYASHI ,  Hisaaki MIYASAKO ,  Junji ISHIHARA ,  Hirokazu MASUDA

IPC: F26B21/10 ,  F26B25/22

CPC classification number: F26B21/10 ,  F26B25/22

Abstract: According to one embodiment of the present disclosure, a drying apparatus includes a drying chamber that holds a drying processing target in an inside thereof, a decompression device that decompresses the inside of the drying chamber; and a controller that controls the decompression device to decompress the inside of the drying chamber, thereby executing a drying processing of evaporating and removing moisture from the drying processing target. The controller executes, after the drying processing, an additional decompression processing of lowering a pressure of the inside of the drying chamber below a pressure at a time of the drying processing, for a predetermined time and determines a dry condition of the drying processing target based on a pressure of the inside of the drying chamber that has been reached after the additional decompression processing.

公开(公告)号：US20250112070A1

公开(公告)日：2025-04-03

申请号：US18894512

申请日：2024-09-24

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Junji ISHIHARA ,  Hisaaki MIYASAKO ,  Yukinobu NISHIBE

IPC: H01L21/673

Abstract: According to one embodiment, a wafer storage container processing apparatus that processes a wafer storage container including a body having a storage space connected to an opening and a door detachable from the opening, includes a stage having a disposition surface on which the wafer storage container is disposed; and a gas supply configured to supply an inert gas to the wafer storage container disposed on the stage. The stage disposes the wafer storage container such that the door is disposed on the disposition surface in a state where the door is attached to the body, and the gas supply supplies the inert gas through a gas supply port provided on an intersecting surface of the body that intersects a surface having the opening.

公开(公告)号：US20250108414A1

公开(公告)日：2025-04-03

申请号：US18897666

申请日：2024-09-26

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Junji ISHIHARA ,  Hisaaki MIYASAKO ,  Yukinobu NISHIBE

IPC: B08B9/20 ,  B65G47/90 ,  H01L21/673

Abstract: According to one embodiment of the present disclosure, a wafer storage container cleaning apparatus includes a cleaning chamber that cleans a wafer storage container including a shell including an opening on one surface and a gripped portion on another surface crossing the one surface with the opening, and a door detachable from the opening; and a transfer robot including a robot hand that individually grips the shell and the door. The robot hand includes a shell gripping portion including a pair of first gripping claws that are movable toward and away from each other along a first straight line; and a door gripping portion including a pair of second gripping claws movable toward and away from each other along a second straight line intersecting the first straight line in a top view. The cleaning chamber cleans the shell with the opening facing downward.