公开(公告)号：US20180286645A1

公开(公告)日：2018-10-04

申请号：US15941853

申请日：2018-03-30

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yoshio KAWAMATA ,  Yu KAMBE

IPC: H01J37/34 ,  H01J37/32

Abstract: A plasma processing apparatus includes a conveyance unit that has a rotator in a vacuum container, and circulating carries a workpiece by the rotator along a circular conveyance path, a cylindrical member extended in a direction toward the conveyance path in the vacuum container, a window member that divides a gas space where a process gas is introduced and an exterior, and an antenna causing the process gas to generate inductive coupling plasma for plasma processing when power is applied. The cylindrical member is provided with an opposing part with the opening and faces the rotator, a dividing wall is provided between the opposing part and the rotator so as not to contact the opposing part and the rotator and not to move relative to the vacuum container, and the dividing wall is provided with an adjustment opening that faces the opening, and adjusts a range of the plasma processing.

公开(公告)号：US20180286644A1

公开(公告)日：2018-10-04

申请号：US15941817

申请日：2018-03-30

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yoshio KAWAMATA ,  Daisuke ONO

IPC: H01J37/34 ,  H01J37/32 ,  H01L21/687 ,  H01L21/02 ,  H01L21/285

Abstract: A plasma processing apparatus includes a vacuum container, a conveyance unit including a rotator and circulating and carrying a workpiece through the conveyance path, a cylindrical member having an opening at one end extended in the direction toward the conveyance path, a window member provided at the cylindrical member, and dividing a gas space from the exterior thereof, a supply unit supplying the process gas in the gas space, and an antenna generating inductive coupling plasma on the workpiece. The supply unit supplies the process gas from plural locations where a passing time at which the surface of the rotator passes through a process region is different, and the plasma processing apparatus further includes an adjusting unit individually adjusting the supply amounts of the process gas from the plural locations of the supply unit per a unit time in accordance with the passing time.