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公开(公告)号：US20190074167A1
公开(公告)日：2019-03-07
申请号：US16123709
申请日：2018-09-06
Applicant: SHIBAURA MECHATRONICS CORPORATION
Inventor： Daisuke ONO , Yu KAMBE
Abstract: A film formation apparatus includes a chamber which has an interior capable of being vacuumed, and which includes a lid that is openable and closable on the upper part of the chamber, a rotation table which is provided in the chamber and which and carries a workpiece in the circular trajectory, a film formation unit that deposits film formation materials by sputtering on the workpiece carried by the rotation table to form films, a shielding member which is provided with an opening at the side which the workpiece passes through, and which forms a film formation room where the film formations by the film formation units are performed, and a support which supports the shielding member, and which is independent relative to the chamber and is independent from the lid.
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公开(公告)号：US20180286645A1
公开(公告)日：2018-10-04
申请号：US15941853
申请日：2018-03-30
Applicant: SHIBAURA MECHATRONICS CORPORATION
Inventor： Yoshio KAWAMATA , Yu KAMBE
Abstract: A plasma processing apparatus includes a conveyance unit that has a rotator in a vacuum container, and circulating carries a workpiece by the rotator along a circular conveyance path, a cylindrical member extended in a direction toward the conveyance path in the vacuum container, a window member that divides a gas space where a process gas is introduced and an exterior, and an antenna causing the process gas to generate inductive coupling plasma for plasma processing when power is applied. The cylindrical member is provided with an opposing part with the opening and faces the rotator, a dividing wall is provided between the opposing part and the rotator so as not to contact the opposing part and the rotator and not to move relative to the vacuum container, and the dividing wall is provided with an adjustment opening that faces the opening, and adjusts a range of the plasma processing.
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