公开(公告)号：US20220248502A1

公开(公告)日：2022-08-04

申请号：US17582298

申请日：2022-01-24

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yuichi IMAOKA ,  Yosuke MOCHIZUKI ,  Kyota KUROIWA ,  Akinori ISO

IPC: H05B3/22

Abstract: According to an embodiment of the present disclosure, a heat treatment device includes: a chamber capable of maintaining an atmosphere that is decompressed from an atmospheric pressure; an exhaust unit capable of exhausting an inside of the chamber through an exhaust port provided in the chamber; a support portion provided inside the chamber and capable of supporting a workpiece; a first heating unit provided inside the chamber and capable of heating the workpiece; an adhesion preventive plate detachably provided on an inner wall of the chamber; and a second heating unit capable of heating the adhesion preventive plate.

公开(公告)号：US20240100577A1

公开(公告)日：2024-03-28

申请号：US18371121

申请日：2023-09-21

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yuichi IMAOKA

IPC: B08B7/04 ,  B08B1/00 ,  B08B3/10 ,  B08B11/02

CPC classification number: B08B7/04 ,  B08B1/002 ,  B08B3/10 ,  B08B11/02

Abstract: According to one embodiment of the present disclosure, a cleaning apparatus includes a plurality of rollers that rotates a substrate in contact with an outer periphery of the substrate; a rotation mechanism including a motor that rotates the rollers about the rotation shaft; a cover interposed between the rollers and the rotation mechanism to cover the rotation mechanism; an ejection port provided in the cover and that ejects gas between the cover and the rollers; a negative pressure region provided in the cover on a side of the rotation mechanism and having a negative pressure lower than an atmospheric pressure outside the cover through exhaust; a liquid ejector that ejects a cleaning liquid onto the substrate; and a cleaning unit that brings the brush into contact with at least one surface of the substrate that is being rotated, thereby cleaning the surface of the substrate.

公开(公告)号：US20180178993A1

公开(公告)日：2018-06-28

申请号：US15856665

申请日：2017-12-28

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yuichi IMAOKA ,  Akinori ISO

IPC: B65G49/06 ,  B65G9/00 ,  B65G49/07 ,  H01L21/677

Abstract: According to one embodiment, a floating conveyor is configured to convey a substrate while floating the substrate. The floating conveyor includes a lower floating section and an upper floating section with a conveying path of the substrate therebetween. A plurality of floating blocks that constitute at least one of the lower floating section and the upper floating section are arranged to be separated by a space, and a floating block that constitutes the other is arranged to face the space.