System and method of cleaning and inspecting semiconductor die carrier

    公开(公告)号:US11945004B2

    公开(公告)日:2024-04-02

    申请号:US17454514

    申请日:2021-11-11

    CPC classification number: B08B1/002 B08B1/02 B08B5/04 B08B5/043

    Abstract: A semiconductor manufacturing equipment cleaning system has a multi-station cleaning and inspection system. Within semiconductor manufacturing equipment cleaning system, a tray cleaning station uses a first rotating brush passing over a first surface of a carrier and possibly semiconductor die, and a second rotating brush passing over a second surface of the carrier and semiconductor die opposite the first surface of the carrier and semiconductor die. Debris and contaminants dislodged from the first surface and second surface of the carrier by the first rotating brush and second rotating brush are removed under vacuum suction. A conveyor transports the carrier through the multi-station cleaning and inspection system. The first rotating brush and second rotating brush move in tandem across the first surface and second surface of the carrier. Air pressure is injected across the first rotating brush and second rotating brush to further remove debris and contaminants.

    CLEANING DEVICE FOR CRYSTALLINE SILICON RECYCLED FROM PHOTOVOLTAIC CELLS BY WET PURIFICATION

    公开(公告)号:US20240050994A1

    公开(公告)日:2024-02-15

    申请号:US18091424

    申请日:2022-12-30

    CPC classification number: B08B3/042 B08B1/002 B08B1/04

    Abstract: A cleaning device for crystalline silicon recycled from photovoltaic cells by wet purification includes at least two tanks, a vacuum pump and first cleaning mechanisms arranged between the tanks. The number of the first cleaning mechanisms is the same as that of the tanks. An upper end of the tank is provided with a cover plate, and a lower end of the tank is provided with a discharge port. The upper end of the tank is provided with a ventilation port. The first cleaning mechanism includes a drum. A lower end of the drum is connected with a lower hood, and an upper end of the drum is connected with an upper hood. A sealing surface is arranged respectively between the drum and the lower hood and between the drum and the upper hood. The device includes the tanks, the vacuum pump and the first cleaning mechanisms.

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