FACILITY FOR TREATING CONTAINERS BY MICROWAVE PLASMA, COMPRISING A SOLID-STATE GENERATOR AND ADJUSTMENT METHOD

    公开(公告)号:US20180363141A1

    公开(公告)日:2018-12-20

    申请号:US15571684

    申请日:2016-04-22

    Abstract: Disclosed is a facility for plasma-assisted chemical vapor deposition, on an inner wall of a polymer container, of a thin barrier layer, and a method for adjusting the facility. The facility includes: an enclosure mounted in a conductive recess; a device for injecting precursor gas into the enclosure; a microwave generator; and a device for diffusing microwaves in the enclosure, connected to the microwave generator, energizing and maintaining a plasma in the precursor gas. The solid-state microwave generator has variable microwave emission frequency. The facility includes a sensor measuring the energy intensity of the plasma produced in the container. The facility includes a control unit connected to the sensor and to the microwave generator, the control unit being programmed to adjust the microwave emission frequency, via the variable frequency drive, in accordance with the value of the physical quantity characterizing the energy intensity measured by the sensor.

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