公开(公告)号：US20240239040A1

公开(公告)日：2024-07-18

申请号：US18416708

申请日：2024-01-18

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Gregory Jacob ,  Stephen Hamann ,  Alexander Payne ,  Lars Eng ,  James Hunter ,  Tianbo Liu ,  Hirofumi Mizuno

IPC: B29C64/135 ,  B29C64/273 ,  B33Y10/00 ,  B33Y30/00 ,  B41J2/44 ,  B41J2/47 ,  B41M3/00 ,  B41M5/00 ,  B41M5/26 ,  G02B26/08 ,  G02B26/10

CPC classification number: B29C64/135 ,  B29C64/273 ,  B33Y10/00 ,  B33Y30/00 ,  B41J2/442 ,  B41J2/471 ,  B41M3/008 ,  B41M5/0058 ,  B41M5/0064 ,  B41M5/262 ,  B41M5/267 ,  G02B26/0808 ,  G02B26/10

Abstract: A laser manufacturing system including a spatial light modulator (SLM) with a rectangular array of electrically actuated two-dimensional (2D) diffractors arranged to form multiple pixels spaced linearly along a long-axis thereof, each pixel including a plurality of 2D diffractors electrically ganged together and arranged along a short-axis perpendicular to the long-axis. The system further includes a laser and optics to illuminate the SLM, and projection optics to project modulated light from the SLM onto a surface of a workpiece to form an anamorphic image of the SLM that is demagnified along the long-axis of the SLM and tightly focused along the short-axis to form a condensed line beam to mark the workpiece. The line beam has a sinc2 profile along the short-axis and a top-hat along the long-axis. Demagnification and the resulting long-axis length at the workpiece is chosen based on the pulse-energy of the laser and targeted peak fluence.

公开(公告)号：US11933962B2

公开(公告)日：2024-03-19

申请号：US17591898

申请日：2022-02-03

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Stephen Hamann ,  Alexander Payne ,  Lars Eng ,  James Hunter ,  Tianbo Liu ,  Gregory Jacob

IPC: G02B26/00 ,  G02B26/02 ,  G02B26/08 ,  G03F7/00

CPC classification number: G02B26/001 ,  G02B26/023 ,  G02B26/0808 ,  G02B26/0841 ,  G03F7/70191

Abstract: Spatial light modulators (SLMs) and systems using same are described. Generally, the system includes a laser, a fixture holding a workpiece to be processed using the laser, illumination optics to illuminate the SLM with laser light, imaging optics to focus modulated light from the SLM onto the workpiece, and a controller to control the laser, the SLM, imaging optics and the fixture to scan the modulated light across a workpiece surface. The SLM includes an array of microelectromechanical system based diffractors, each including an electrostatically deflectable member coupled to a first light reflective surface and to bring light reflected from the first light reflective surface into interference with light reflected from a second light reflective surface in the SLM. The controller is operable to provide analog gray-scale control of an intensity of modulated light reflected from each diffractor by controlling an electrostatic force generated by a driver coupled thereto.

公开(公告)号：US20220252866A1

公开(公告)日：2022-08-11

申请号：US17591834

申请日：2022-02-03

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Alexander Payne ,  Gregory Jacob

IPC: G02B26/08 ,  G02B26/02

Abstract: Microelectromechanical systems (MEMS) based spatial light modulators (SLMs) enclosed in a package filled with a gas to enhance the reliability and lifetime of the SLM, and methods for operating the same in various applications are described. Generally, the SLM includes a number of MEMS modulators, each including a number of light reflective surfaces, at least one light reflective surface coupled to an electrostatically deflectable element suspended above a substrate, and each adapted to reflect and modulate a light beam incident thereon. The package enclosing the SLM includes an optically transparent cover through which the reflective surfaces are exposed to the light beam, and a cavity is filled a low molar mass fill gas having an atomic number of two or less and a thermal conductivity of greater than 100 mW/(m·K). The SLM can include electrostatically deflectable ribbons suspended over a substrate, or a linear array of two-dimensional MEMS modulators.

公开(公告)号：US20220250188A1

公开(公告)日：2022-08-11

申请号：US17591884

申请日：2022-02-03

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Gregory Jacob ,  Stephen Hamann ,  Alexander Payne ,  Lars Eng ,  James Hunter

IPC: B23K26/064 ,  B81B3/00

Abstract: A laser marking system including a spatial light modulator (SLM) with a multi-pixel, linear array of is microelectromechanical systems (MEMS) based diffractors, and methods of operating the same are disclosed. Generally, the system includes, in addition to the SLM, a laser operable to illuminate the SLM; imaging optics operable to focus a substantially linear swath of modulated light onto a surface of a workpiece, the linear swath including light from multiple pixels of the SLM, and a controller operable to control the SLM, laser and imaging optics to mark the surface of the workpiece to record a two-dimensional image thereon. In one embodiment, the diffractors include a number of electrostatically deflectable ribbons suspended over a substrate. In another, each diffractor is two-dimensional including an electrostatically deflectable first reflective operable to brought into optical interference with light reflected from a second reflective surface on a faceplate, or an adjacent diffractor.

公开(公告)号：US20240369824A1

公开(公告)日：2024-11-07

申请号：US18441275

申请日：2024-02-14

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Stephen Hamann ,  Alexander Payne ,  Lars Eng ,  James Hunter ,  Tianbo Liu ,  Gregory Jacob

IPC: G02B26/00 ,  G02B26/02 ,  G02B26/08 ,  G03F7/00

Abstract: Spatial light modulators (SLMs) and systems using same are described. Generally, the system includes a laser, a fixture holding a workpiece to be processed using the laser, illumination optics to illuminate the SLM with laser light, imaging optics to focus modulated light from the SLM onto the workpiece, and a controller to control the laser, the SLM, imaging optics and the fixture to scan the modulated light across a workpiece surface. The SLM includes an array of microelectromechanical system based diffractors, each including an electrostatically deflectable member coupled to a first light reflective surface and to bring light reflected from the first light reflective surface into interference with light reflected from a second light reflective surface in the SLM. The controller is operable to provide analog gray-scale control of an intensity of modulated light reflected from each diffractor by controlling an electrostatic force generated by a driver coupled thereto.

公开(公告)号：US20220252862A1

公开(公告)日：2022-08-11

申请号：US17591898

申请日：2022-02-03

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Stephen Hamann ,  Alexander Payne ,  Lars Eng ,  James Hunter ,  Tianbo Liu ,  Gregory Jacob

IPC: G02B26/02 ,  G03F7/20

Abstract: Spatial light modulators (SLMs) and systems using same are described. Generally, the system includes a laser, a fixture holding a workpiece to be processed using the laser, illumination optics to illuminate the SLM with laser light, imaging optics to focus modulated light from the SLM onto the workpiece, and a controller to control the laser, the SLM, imaging optics and the fixture to scan the modulated light across a workpiece surface. The SLM includes an array of microelectromechanical system based diffractors, each including an electrostatically deflectable member coupled to a first light reflective surface and to bring light reflected from the first light reflective surface into interference with light reflected from a second light reflective surface in the SLM. The controller is operable to provide analog gray-scale control of an intensity of modulated light reflected from each diffractor by controlling an electrostatic force generated by a driver coupled thereto.