公开(公告)号：US10355038B2

公开(公告)日：2019-07-16

申请号：US15653819

申请日：2017-07-19

Applicant: Sony Corporation

Inventor： Yoichi Ootsuka ,  Tomoyuki Yamashita ,  Kiyotaka Tabuchi ,  Yoshinori Toumiya ,  Akiko Ogino

IPC: H01L27/00 ,  H01L27/146 ,  H04N5/335

Abstract: A solid-state imaging device includes: a first lens layer; and a second lens layer, wherein the second lens layer is formed at least at a periphery of each first microlens formed based on the first lens layer, and the second lens layer present at a central portion of each of the first microlenses is thinner than the second lens layer present at the periphery of the first microlens or no second lens layer is present at the central portion of each of the first microlenses.

公开(公告)号：US11211417B2

公开(公告)日：2021-12-28

申请号：US16440684

申请日：2019-06-13

Applicant: Sony Corporation

Inventor： Yoichi Ootsuka ,  Tomoyuki Yamashita ,  Kiyotaka Tabuchi ,  Yoshinori Toumiya ,  Akiko Ogino

IPC: H01L27/14 ,  H01L27/146 ,  H04N5/335

Abstract: A solid-state imaging device includes: a first lens layer; and a second lens layer, wherein the second lens layer is formed at least at a periphery of each first microlens formed based on the first lens layer, and the second lens layer present at a central portion of each of the first microlenses is thinner than the second lens layer present at the periphery of the first microlens or no second lens layer is present at the central portion of each of the first microlenses.

公开(公告)号：US20160013234A1

公开(公告)日：2016-01-14

申请号：US14861175

申请日：2015-09-22

Applicant: c/o SONY CORPORATION

Inventor： Yoichi Ootsuka ,  Tomoyuki Yamashita ,  Kiyotaka Tabuchi ,  Yoshinori Toumiya ,  Akiko Ogino

IPC: H01L27/146

CPC classification number: H01L27/14627 ,  H01L27/14612 ,  H01L27/14621 ,  H01L27/14685 ,  H04N5/335

Abstract: A solid-state imaging device includes: a first lens layer; and a second lens layer, wherein the second lens layer is formed at least at a periphery of each first microlens formed based on the first lens layer, and the second lens layer present at a central portion of each of the first microlenses is thinner than the second lens layer present at the periphery of the first microlens or no second lens layer is present at the central portion of each of the first microlenses.

Abstract translation: 固态成像装置包括：第一透镜层; 以及第二透镜层，其中所述第二透镜层至少形成在基于所述第一透镜层形成的每个第一微透镜的周边，并且存在于所述第一微透镜的每一个的中心部分处的所述第二透镜层比 存在于第一微透镜的周边的第二透镜层或者没有第二透镜层存在于每个第一微透镜的中心部分。

公开(公告)号：US08779541B2

公开(公告)日：2014-07-15

申请号：US13679334

申请日：2012-11-16

Applicant: Sony Corporation

Inventor： Sintaro Nakajiki ,  Yukihiro Sayama ,  Yuichi Seki ,  Masanori Harasawa ,  Yoshinori Toumiya

IPC: H01L31/0232 ,  H01L31/00 ,  H01L27/146 ,  G02B5/20 ,  G02B3/00 ,  G02B5/22

CPC classification number: H01L27/14627 ,  G02B3/0018 ,  G02B5/201 ,  G02B5/223 ,  H01L27/14621 ,  H01L27/14683 ,  H01L27/14685

Abstract: A solid-state imaging device including a plurality of pixels arranged two-dimensionally, wherein each of the pixels has at least a planarizing film formed on the upper side of a photoelectric conversion element, a filter formed on the upper side of the planarizing film, and a microlens formed on the upper side of the filter. The filter of some of the pixels is a color filter permitting transmission therethrough of light of a predetermined color component, whereas the filter of other pixels is a white filter permitting transmission therethrough of light in the whole visible spectral range. The refractive indices of the white filter, the microlens and the planarizing film have the following relationship: (Refractive index of white filter)≧(Refractive index of microlens)>(Refractive index of planarizing film).

Abstract translation: 一种固态成像装置，包括二维排列的多个像素，其中，每个像素至少具有形成在光电转换元件的上侧的平坦化膜，形成在平坦化膜的上侧的过滤器， 以及形成在过滤器的上侧的微透镜。 一些像素的滤光器是允许通过其预定颜色分量的光透射的滤色器，而其它像素的滤光器是允许在整个可见光谱范围内透射光的白色滤光片。 白色滤光片，微透镜和平坦化膜的折射率具有以下关系：（白色滤光片的折射率）≥（微透镜的折射率）>（平坦化膜的折射率）。

公开(公告)号：US20130134537A1

公开(公告)日：2013-05-30

申请号：US13679334

申请日：2012-11-16

Applicant: Sony Corporation

Inventor： Sintaro Nakajiki ,  Yukihiro Sayama ,  Yuichi Seki ,  Masanori Harasawa ,  Yoshinori Toumiya

IPC: H01L27/146 ,  G02B5/22

CPC classification number: H01L27/14627 ,  G02B3/0018 ,  G02B5/201 ,  G02B5/223 ,  H01L27/14621 ,  H01L27/14683 ,  H01L27/14685

Abstract: Disclosed herein is a solid-state imaging device including a plurality of pixels arranged two-dimensionally, wherein the pixels each have at least a planarizing film formed on the upper side of a photoelectric conversion element, a filter formed on the upper side of the planarizing film, and a microlens formed on the upper side of the filter. The filters of a part of the pixels are each a color filter permitting transmission therethrough of light of a predetermined color component, whereas the filters of another part of the pixels are each a white filter permitting transmission therethrough of light in the whole visible spectral range. The refractive indices of the white filter, the microlens and the planarizing film are in the following relationship: (Refractive index of white filter)≧(Refractive index of microlens)>(Refractive index of planarizing film).

Abstract translation: 本文公开了一种固态成像装置，其包括二维排列的多个像素，其中，像素各自至少形成在光电转换元件的上侧的平坦化膜，形成在平坦化的上侧的滤光器 膜和形成在过滤器的上侧的微透镜。 像素的一部分的滤光器各自是允许通过其预定颜色分量的光的透射的滤色器，而另一部分像素的滤光器各自是白色滤光片，允许在整个可见光谱范围内透射光。 白色滤光片，微透镜和平坦化膜的折射率如下：（白色滤光片的折射率）> =（微透镜的折射率）>（平面化膜的折射率）。

公开(公告)号：US09263493B2

公开(公告)日：2016-02-16

申请号：US14340350

申请日：2014-07-24

Applicant: Sony Corporation

Inventor： Sintaro Nakajiki ,  Yukihiro Sayama ,  Yoshinori Toumiya ,  Tadayuki Dofuku ,  Toyomi Jinwaki

IPC: H01L27/146

CPC classification number: H01L27/14643 ,  H01L27/14623 ,  H01L27/14627 ,  H01L27/14685 ,  H01L27/14689

Abstract: Provided is an image pickup element, including: condenser lenses made of a resin containing fine metal particles; photoelectric conversion elements formed in a silicon substrate and each configured to photoelectrically convert incident light that enter from an outside through corresponding one of the condenser lenses; and a protective film made of a silicon compound, the protective film being formed between the condenser lenses and the silicon substrate.

Abstract translation: 提供一种图像拾取元件，包括：由含有金属微粒的树脂制成的聚光透镜; 光电转换元件形成在硅衬底中，每一个被配置为对通过相应的一个聚光透镜从外部进入的入射光进行光电转换; 以及由硅化合物制成的保护膜，保护膜形成在聚光透镜和硅衬底之间。

公开(公告)号：US20150035105A1

公开(公告)日：2015-02-05

申请号：US14340350

申请日：2014-07-24

Applicant: Sony Corporation

Inventor： Sintaro Nakajiki ,  Yukihiro Sayama ,  Yoshinori Toumiya ,  Tadayuki Dofuku ,  Toyomi Jinwaki

IPC: H01L27/146

CPC classification number: H01L27/14643 ,  H01L27/14623 ,  H01L27/14627 ,  H01L27/14685 ,  H01L27/14689

Abstract: Provided is an image pickup element, including: condenser lenses made of a resin containing fine metal particles; photoelectric conversion elements formed in a silicon substrate and each configured to photoelectrically convert incident light that enter from an outside through corresponding one of the condenser lenses; and a protective film made of a silicon compound, the protective film being formed between the condenser lenses and the silicon substrate.

Abstract translation: 提供一种图像拾取元件，包括：由含有金属微粒的树脂制成的聚光透镜; 光电转换元件形成在硅衬底中，每一个被配置为对通过相应的一个聚光透镜从外部进入的入射光进行光电转换; 以及由硅化合物制成的保护膜，保护膜形成在聚光透镜和硅衬底之间。

公开(公告)号：US08884392B2

公开(公告)日：2014-11-11

申请号：US14087737

申请日：2013-11-22

Applicant: Sony Corporation

Inventor： Yoshinori Toumiya ,  Ina Hori ,  Tadayuki Dofuku ,  Hitomi Kamiya ,  Atsushi Yamamoto ,  Taichi Natori

IPC: H01L31/0232 ,  H01L27/146 ,  H01L27/148

CPC classification number: H01L27/14627 ,  H01L27/14636 ,  H01L27/14643 ,  H01L27/14685 ,  H01L27/148

Abstract: Disclosed herein is a method of manufacturing a solid state imaging device, including the steps of: forming a light receiving portion in a light receiving area of a semiconductor substrate; forming a pad portion in a pad area of the semiconductor substrate; forming a microlens material layer over the light receiving portion and the pad portion; providing the microlens material layer with a microlens corresponding to the light receiving portion; forming a low-reflection material layer on the microlens material layer; etching the microlens material layer and the low-reflection material layer over the pad portion to form an opening; and imparting hydrophilicity to a surface of the low-reflection material layer and an inside portion of the opening by a normal temperature oxygen radical treatment.

Abstract translation: 本文公开了一种制造固态成像装置的方法，包括以下步骤：在半导体衬底的光接收区域中形成光接收部分; 在所述半导体衬底的焊盘区域中形成焊盘部分; 在所述光接收部分和所述焊盘部分上形成微透镜材料层; 向所述微透镜材料层提供对应于所述光接收部分的微透镜; 在微透镜材料层上形成低反射材料层; 在所述焊盘部分上蚀刻所述微透镜材料层和所述低反射材料层以形成开口; 并通过常温氧自由基处理赋予低反射材料层的表面和开口的内部亲水性。

公开(公告)号：US20140267847A1

公开(公告)日：2014-09-18

申请号：US14289192

申请日：2014-05-28

Applicant: Sony Corporation

Inventor： Yoshinori Toumiya ,  Yoichi Ootsuka

IPC: H04N9/04 ,  H04N5/225 ,  H04N5/369

CPC classification number: H04N9/045 ,  H01L27/14605 ,  H01L27/14627 ,  H01L27/14629 ,  H01L27/14685 ,  H04N5/2254 ,  H04N5/369 ,  Y10T29/49002

Abstract: A solid-state imaging device includes a pixel that has a photoelectric conversion section which converts incident light into an electric signal; a color filter which is formed corresponding to the pixel; a micro lens which focuses the incident light to the photoelectric conversion section via the color filter; and an in-layer lens which is formed between the color filter and the micro lens and has a refractive index smaller than that of the micro lens.

Abstract translation: 固态成像装置包括具有将入射光转换为电信号的光电转换部的像素; 对应于像素形成的滤色器; 微透镜，其通过滤色器将入射光聚焦到光电转换部分; 以及形成在滤色器和微透镜之间并且具有比微透镜的折射率小的折射率的层内透镜。

公开(公告)号：US20140084406A1

公开(公告)日：2014-03-27

申请号：US14087737

申请日：2013-11-22

Applicant: Sony Corporation

Inventor： Yoshinori Toumiya ,  Ina Hori ,  Tadayuki Dofuku ,  Hitomi Kamiya ,  Atsushi Yamamoto ,  Taichi Natori

IPC: H01L27/146

CPC classification number: H01L27/14627 ,  H01L27/14636 ,  H01L27/14643 ,  H01L27/14685 ,  H01L27/148

Abstract: Disclosed herein is a method of manufacturing a solid state imaging device, including the steps of: forming a light receiving portion in a light receiving area of a semiconductor substrate; forming a pad portion in a pad area of the semiconductor substrate; forming a microlens material layer over the light receiving portion and the pad portion; providing the microlens material layer with a microlens corresponding to the light receiving portion; forming a low-reflection material layer on the microlens material layer; etching the microlens material layer and the low-reflection material layer over the pad portion to form an opening; and imparting hydrophilicity to a surface of the low-reflection material layer and an inside portion of the opening by a normal temperature oxygen radical treatment.

Abstract translation: 本文公开了一种制造固态成像装置的方法，包括以下步骤：在半导体衬底的光接收区域中形成光接收部分; 在所述半导体衬底的焊盘区域中形成焊盘部分; 在所述光接收部分和所述焊盘部分上形成微透镜材料层; 向所述微透镜材料层提供对应于所述光接收部分的微透镜; 在微透镜材料层上形成低反射材料层; 在所述焊盘部分上蚀刻所述微透镜材料层和所述低反射材料层以形成开口; 并通过常温氧自由基处理赋予低反射材料层的表面和开口的内部亲水性。