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公开(公告)号:US20240047504A1
公开(公告)日:2024-02-08
申请号:US18467364
申请日:2023-09-14
发明人: Taiichiro WATANABE , Akihiro YAMADA , Hideo KIDO , Hiromasa SAITO , Keiji MABUCHI , Yuko OHGISHI
IPC分类号: H01L27/148 , H01L27/146
CPC分类号: H01L27/14887 , H01L27/14603 , H01L27/14647 , H01L27/1464 , H01L27/14641 , H01L27/14625 , H01L27/14656
摘要: A solid-state imaging device includes: plural photodiodes formed in different depths in a unit pixel area of a substrate; a plural vertical transistors formed in the depth direction from one face side of the substrate so that gate portions for reading signal charges obtained by photelectric conversion in the plural photodiodes are formed in depths corresponding to the respective photodiodes.