公开(公告)号：US20220367722A1

公开(公告)日：2022-11-17

申请号：US17767333

申请日：2020-08-26

Applicant: SOUTHEAST UNIVERSITY ,  CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Wangran WU ,  Guangan YANG ,  Feng LIN ,  Guipeng SUN ,  Yaohui WANG ,  Weifeng SUN ,  Longxing SHI

IPC: H01L29/786 ,  H01L21/02 ,  H01L29/66

Abstract: An IGZO thin-film transistor and a method for manufacturing same. The method comprises: acquiring a substrate; forming an IGZO layer on the substrate by means of a solution process; doping V impurities on a surface of the IGZO layer by means of a spin doping process; forming a source electrode at one side of the IGZO layer, and forming a drain electrode at the other side thereof; forming a gate dielectric layer on the doped IGZO layer; and forming a gate electrode on the gate dielectric layer.