公开(公告)号：US20180190841A1

公开(公告)日：2018-07-05

申请号：US15904296

申请日：2018-02-23

Applicant: STC.UNM

Inventor： Sang Eon Han ,  Brittany R. Hoard ,  Sang M. Han ,  Swapnadip Ghosh

IPC: H01L31/0236 ,  G02B1/00 ,  H01L31/20 ,  H01L31/18 ,  H03H9/145 ,  H03H9/25 ,  H03H9/10 ,  H01L31/0747

CPC classification number: H01L31/02363 ,  G02B1/005 ,  H01L31/0747 ,  H01L31/1804 ,  H01L31/202 ,  H01L31/208 ,  H03H9/10 ,  H03H9/145 ,  H03H9/25 ,  Y02E10/547 ,  Y02P70/521

Abstract: Provided is a method for fabricating a nano-patterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

公开(公告)号：US20170110602A1

公开(公告)日：2017-04-20

申请号：US15389936

申请日：2016-12-23

Applicant: STC.UNM

Inventor： Sang Eon Han ,  Brittany R. Hoard ,  Sang M. Han ,  Swapnadip Ghosh

IPC: H01L31/0236 ,  G02B1/00 ,  H01L31/20 ,  H01L31/0747 ,  H01L31/18

CPC classification number: H01L31/02363 ,  G02B1/005 ,  H01L31/0747 ,  H01L31/1804 ,  H01L31/202 ,  H01L31/208 ,  H03H9/10 ,  H03H9/145 ,  H03H9/25 ,  Y02E10/547 ,  Y02P70/521

Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

公开(公告)号：US10483415B2

公开(公告)日：2019-11-19

申请号：US15904296

申请日：2018-02-23

Applicant: STC.UNM

Inventor： Sang Eon Han ,  Brittany R. Hoard ,  Sang M. Han ,  Swapnadip Ghosh

IPC: G02B1/00 ,  H01L31/0236 ,  H01L31/18 ,  H01L31/0747 ,  H01L31/20 ,  H03H9/10 ,  H03H9/145 ,  H03H9/25

Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

公开(公告)号：US20160284886A1

公开(公告)日：2016-09-29

申请号：US15030039

申请日：2014-10-17

Applicant: STC.UNM

Inventor： Sang Eon Han ,  Brittany R. Hoard ,  Sang M. Han ,  Swapnadip Ghosh

IPC: H01L31/0236 ,  H01L31/20 ,  H01L31/0747

CPC classification number: H01L31/02363 ,  G02B1/005 ,  H01L31/0747 ,  H01L31/1804 ,  H01L31/202 ,  H01L31/208 ,  H03H9/10 ,  H03H9/145 ,  H03H9/25 ,  Y02E10/547 ,  Y02P70/521

Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

Abstract translation: 提供了一种制造纳米图案表面的方法。 该方法包括在衬底上形成掩模，图案化衬底以包括多个对称破裂表面波纹，以及去除掩模。 掩模包括由覆盖基板的第一表面部分的掩模材料部分限定的图案和暴露基板的第二表面部分的多个掩模空间部分，其中多个掩模空间部分布置成具有排的格子布置 和列，并且该行不平行于衬底的[110]方向取向。 图案化衬底包括由多个空间暴露的各向异性去除部分的衬底。

公开(公告)号：US09941426B2

公开(公告)日：2018-04-10

申请号：US15389936

申请日：2016-12-23

Applicant: STC.UNM

Inventor： Sang Eon Han ,  Brittany R. Hoard ,  Sang M. Han ,  Swapnadip Ghosh

IPC: H01L27/14 ,  H01L31/0236 ,  H01L31/0747 ,  H01L31/18 ,  H01L31/20 ,  G02B1/00 ,  H03H9/145 ,  H03H9/10 ,  H03H9/25

CPC classification number: H01L31/02363 ,  G02B1/005 ,  H01L31/0747 ,  H01L31/1804 ,  H01L31/202 ,  H01L31/208 ,  H03H9/10 ,  H03H9/145 ,  H03H9/25 ,  Y02E10/547 ,  Y02P70/521

Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

公开(公告)号：US09530906B2

公开(公告)日：2016-12-27

申请号：US15030039

申请日：2014-10-17

Applicant: STC.UNM

Inventor： Sang Eon Han ,  Brittany R. Hoard ,  Sang M. Han ,  Swapnadip Ghosh

IPC: H01L21/00 ,  H01L31/0236 ,  H01L31/0747 ,  H01L31/20

CPC classification number: H01L31/02363 ,  G02B1/005 ,  H01L31/0747 ,  H01L31/1804 ,  H01L31/202 ,  H01L31/208 ,  H03H9/10 ,  H03H9/145 ,  H03H9/25 ,  Y02E10/547 ,  Y02P70/521

Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

Abstract translation: 提供了一种制造纳米图案表面的方法。 该方法包括在衬底上形成掩模，图案化衬底以包括多个对称破裂表面波纹，以及去除掩模。 掩模包括由覆盖基板的第一表面部分的掩模材料部分限定的图案和暴露基板的第二表面部分的多个掩模空间部分，其中多个掩模空间部分布置成具有排的格子布置 和列，并且该行不平行于衬底的[110]方向取向。 图案化衬底包括由多个空间暴露的各向异性去除部分的衬底。