公开(公告)号：US20150108576A1

公开(公告)日：2015-04-23

申请号：US14501639

申请日：2014-09-30

Applicant: STMICROELECTRONICS (CROLLES 2) SAS

Inventor： David BARGE ,  Philippe GARNIER ,  Yves CAMPIDELLI

IPC: H01L21/8238 ,  H01L21/02 ,  H01L29/08 ,  H01L27/12

CPC classification number: H01L21/02609 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262 ,  H01L21/02636 ,  H01L21/84 ,  H01L27/1203 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/66742 ,  H01L29/78618

Abstract: An integrated circuit includes an NMOS transistor and a PMOS transistor on different regions of an SOT substrate. Each transistor includes a gate region, multilayer lateral insulating regions against the sides of the gate region while also on the substrate. Each multilayer lateral insulating region includes an inclined portion sloping away from the substrate. Source and drain regions are on the substrate and are separated from the sides of the gate region by the corresponding multilayer lateral insulating region. The source and drain regions have an inclined portion resting against the inclined portion of the the lateral insulating region.

Abstract translation: 集成电路包括在SOT衬底的不同区域上的NMOS晶体管和PMOS晶体管。 每个晶体管包括栅极区域，在栅极区域的侧面上的多层横向绝缘区域，同时也在衬底上。 每个多层横向绝缘区域包括远离基板倾斜的倾斜部分。 源区和漏区在衬底上，并通过相应的多层横向绝缘区与栅极区的侧面分离。 源极和漏极区域具有靠在横向绝缘区域的倾斜部分的倾斜部分。