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公开(公告)号:US11581449B2
公开(公告)日:2023-02-14
申请号:US16703689
申请日:2019-12-04
Applicant: STMicroelectronics (Crolles 2) SAS
Inventor: Younes Benhammou , Dominique Golanski , Denis Rideau
IPC: H01L31/107 , H01L31/028 , H01L31/0745 , H01L31/18
Abstract: The present disclosure relates to a photodiode comprising a first part made of silicon and a second part made of doped germanium lying on and in contact with the first part, the first part comprising a stack of a first area and of a second area forming a p-n junction and the doping level of the germanium increasing as the distance from the p-n junction increases.