公开(公告)号：US20040252554A1

公开(公告)日：2004-12-16

申请号：US10726263

申请日：2003-12-02

Applicant: STMicroelectronics S.A.

Inventor： Richard Fournel ,  Emmanuel Vincent ,  Sylvie Bruyere ,  Philippe Candelier ,  Francois Jacquet

IPC: G11C016/04

CPC classification number: G11C14/00 ,  G11C17/14

Abstract: An SRAM memory cell includes first and second inverters (14, 16) interconnected between first and second data nodes. Each inverter is formed from complementary MOS transistors (18, 20, 18null, 20null) connected in series between a DC voltage supply source and a grounding circuit (22). A circuit (28, 30) programs the MOS transistors by causing an irreversible degradation of a gate oxide layer of at least some of the transistors (18, 18null).

Abstract translation: SRAM存储单元包括在第一和第二数据节点之间互连的第一和第二反相器（14,16）。 每个反相器由串联连接在DC电压源和接地电路（22）之间的互补MOS晶体管（18,20,18'，20'）形成。 电路（28,30）通过使至少一些晶体管（18,18'）的栅极氧化层不可逆地退化来对MOS晶体管进行编程。