Protection of memory areas
    4.
    发明授权
    Protection of memory areas 有权
    保护记忆区

    公开(公告)号:US09223996B2

    公开(公告)日:2015-12-29

    申请号:US13751628

    申请日:2013-01-28

    摘要: A method for loading a program, contained in at least a first memory, into a second memory accessible by an execution unit, in which the program is in a cyphered form in the first memory, a circuit for controlling the access to the second memory is configured from program initialization data, instructions of the program, and at least initialization data being decyphered to be transferred into the second memory after configuration of the circuit.

    摘要翻译: 一种用于将包含在至少第一存储器中的程序加载到执行单元可访问的第二存储器中的方法,其中程序处于第一存储器中的加密形式,用于控制对第二存储器的访问的电路是 由程序初始化数据,程序的指令,以及至少初始化数据被解密以在电路配置之后被传送到第二存储器中。

    Image sensor with a curved surface
    6.
    发明授权
    Image sensor with a curved surface 有权
    具有曲面的图像传感器

    公开(公告)号:US09099604B2

    公开(公告)日:2015-08-04

    申请号:US13858481

    申请日:2013-04-08

    CPC分类号: H01L31/18 H01L27/14605

    摘要: A method for manufacturing an image sensor, including the successive steps of: forming columns of a semiconductor material; forming one or several pixels at a first end of each of the columns; and deforming the structure so that the second ends of each of the columns come closer to each other or draw away from each other to form a surface in the shape of a polyhedral cap.

    摘要翻译: 一种用于制造图像传感器的方法,包括以下连续步骤:形成半导体材料的列; 在每个列的第一端形成一个或几个像素; 并且使结构变形使得每个柱的第二端彼此靠近或彼此拉开以形成多面体盖的形状的表面。

    MOS transistor
    7.
    发明授权
    MOS transistor 有权
    MOS晶体管

    公开(公告)号:US09012957B2

    公开(公告)日:2015-04-21

    申请号:US14017024

    申请日:2013-09-03

    发明人: Vincent Quenette

    摘要: A MOS transistor including a U-shaped channel-forming semiconductor region and source and drain regions having the same U shape located against the channel-forming region on either side thereof, the internal surface of the channel-forming semiconductor region being coated with a conductive gate, a gate insulator being interposed.

    摘要翻译: 一种MOS晶体管,包括U形沟道形成半导体区域和具有相同U形的源极和漏极区域,其位于其任一侧上的沟道形成区域,沟道形成半导体区域的内表面涂覆有导电 栅极,插入栅极绝缘体。

    Back-side illuminated image sensor with a junction insulation
    8.
    发明授权
    Back-side illuminated image sensor with a junction insulation 有权
    具有结合绝缘的背面照明图像传感器

    公开(公告)号:US08963273B2

    公开(公告)日:2015-02-24

    申请号:US14247084

    申请日:2014-04-07

    IPC分类号: H01L31/00 H01L27/146

    摘要: A method for forming a back-side illuminated image sensor, including the steps of: a) forming, from the front surface, doped polysilicon regions, of a conductivity type opposite to that of the substrate, extending in depth orthogonally to the front surface and emerging into the first layer; b) thinning the substrate from its rear surface to reach the polysilicon regions, while keeping a strip of the first layer; c) depositing, on the rear surface of the thinned substrate, a doped amorphous silicon layer, of a conductivity type opposite to that of the substrate; and d) annealing at a temperature capable of transforming the amorphous silicon layer into a crystallized layer.

    摘要翻译: 一种用于形成背面照明图像传感器的方法,包括以下步骤:a)从前表面形成与衬底相反的导电类型的掺杂多晶硅区域,其垂直于正面延伸, 进入第一层; b)使衬底从其后表面变薄到达多晶硅区域,同时保持第一层的条带; c)在所述薄化衬底的后表面上沉积与所述衬底相反的导电类型的掺杂非晶硅层; 和d)在能够将非晶硅层转变成结晶层的温度下退火。