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公开(公告)号:US20150050868A1
公开(公告)日:2015-02-19
申请号:US14385849
申请日:2013-03-21
发明人: Mitsuo Taketani , Toyotaro Maruyama
IPC分类号: B24B37/27
CPC分类号: B24B37/27 , B24B37/28 , B24B41/06 , Y10T442/2992
摘要: The invention provides a holder for a polished work in which the warpage suppression or plate thickness accuracy of the holder for a polished work is improved, the generation of scratches in a polished work is suppressed so as to improve the abrasion resistance, and furthermore, economic advantages are provided. The holder for a polished work of the invention includes a first resin layer produced by impregnating a first resin composition into a first fiber base material, and heating and pressurizing the first fiber base material as an outermost layer, the first fiber base material is a glass fiber base material, and a structure derived from a resin having a novolac skeleton is included in a proportion of 50 mass % or more in the first resin layer excluding the first fiber base material.
摘要翻译: 本发明提供了一种用于抛光工件的保持器,其中提高了用于抛光工件的保持器的翘曲抑制或板厚度精度,抑制了抛光工件中的划痕的产生以提高耐磨性,此外,经济 提供优点。 本发明的抛光用具的保持具包括通过将第一树脂组合物浸渍到第一纤维基材中而制成的第一树脂层,对作为最外层的第一纤维基材进行加热加压,第一纤维基材为玻璃 纤维基材和来自具有酚醛清漆骨架的树脂的结构在除第一纤维基材以外的第一树脂层中的比例为50质量%以上。