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公开(公告)号：US20220098720A1
公开(公告)日：2022-03-31
申请号：US17550010
申请日：2021-12-14
发明人： Koshi NISHIDA , Susumu SAKIO , Katsuhiko KISHIMOTO
摘要： A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal body formed on the resin layer, the method including the steps of: (A) providing a magnetic metal body having at least one first opening; (B) providing a substrate; (C) forming a resin layer by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate, and then performing a heat treatment thereon; (D) securing the resin layer formed on the substrate on the magnetic metal body so as to cover the at least one first opening; (E) forming a plurality of second openings in a region of the resin layer that is located in the at least one first opening of the magnetic metal body; and (F) after the step (E), removing the substrate from the resin layer.
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2.发明申请公开(公告)号：US20190211436A1
公开(公告)日：2019-07-11
申请号：US16315327
申请日：2017-01-31
发明人： Koshi NISHIDA , Susumu SAKIO , Katsuhiko KISHIMOTO
摘要： A method for manufacturing a vapor deposition mask (100) including a resin layer (10), and a magnetic metal body (20) formed on the resin layer (10), the method including the steps of: (A) providing a magnetic metal body (20) having at least one first opening (25); (B) providing a substrate (60); (C) forming a resin layer (10) by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate (60), and then performing a heat treatment thereon; (D) securing the resin layer (10) formed on the substrate (60) on the magnetic metal body (20) so as to cover the at least one first opening (25); (E) forming a plurality of second openings (13) in a region of the resin layer (10) that is located in the at least one first opening (25) of the magnetic metal body (20); and (F) after the step (E), removing the substrate (60) from the resin layer (10).
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公开(公告)号：US20200020862A1
公开(公告)日：2020-01-16
申请号：US16548369
申请日：2019-08-22
发明人： Katsuhiko KISHIMOTO , Susumu SAKIO
IPC分类号： H01L51/00 , B23K11/11 , B23K26/0622 , B23K26/08 , B23K26/22 , H01L27/32 , H01L51/56 , C23C14/04
摘要： A mask substrate includes a resin layer. A step of forming openings in a mask substrate includes step A of forming openings of “a” number of continual columns included in a first region (R1) including at least the (n/2)th column or the {(n+1)/2}th column; step B of forming openings of “b” number of continual columns included in a second region (R2) adjacent to the first region (R1) in a −x direction with a first gap region (RS1) being sandwiched between the first and second regions, the first gap region including “sa” number of continual columns; and step C of forming openings of “c” number of continual columns included in a third region (R3) adjacent to the first region (R1) in an x direction with a second gap region (RS2) being sandwiched between the first and third regions, the second gap region including “sb” number of continual columns.
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4.发明申请公开(公告)号：US20190249290A1
公开(公告)日：2019-08-15
申请号：US15757437
申请日：2017-08-21
发明人： Katsuhiko KISHIMOTO , Susumu SAKIO
CPC分类号： C23C14/042 , C23C14/24 , C23C14/50 , H01L27/32 , H01L27/3244 , H01L51/0011 , H01L51/50 , H01L51/56 , H01L2227/323 , H05B33/10
摘要： Provided are a vapor deposition apparatus, a vapor deposition method, and a method of manufacturing an organic EL display apparatus which can prevent heat generation of a magnet chuck by using the magnet chuck that strongly attracts a deposition mask to dispose a substrate for vapor deposition and the deposition mask in proximity to each other during vapor deposition, while being less influenced by any magnetic field during alignment between the substrate for vapor deposition and the deposition mask. In the vapor deposition apparatus, a magnet chuck (3) includes a permanent magnet (3A) and an electromagnet (3B).
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5.发明申请公开(公告)号：US20190249289A1
公开(公告)日：2019-08-15
申请号：US15757420
申请日：2017-08-21
发明人： Susumu SAKIO , Katsuhiko KISHIMOTO
摘要： A vapor deposition apparatus disclosed by an embodiment comprises: a vacuum chamber (8); a mask holder (15) for holding a deposition mask 1; a substrate holder (29) for holding a substrate for vapor deposition (2); an electromagnet (3) disposed above a surface; a vapor deposition source 5 for vaporizing or sublimating a vapor deposition material; and a heat pipe (7) including at least a heat absorption part (71) and a heat dissipation part (72), the heat absorption part being in contact with the electromagnet (3), and the heat dissipation part being derived to an outside of the vacuum chamber (8). The heat pipe (7) and the electromagnet (3) are in intimate contact with each other at an area of a contact part between the heat pipe (7) and the electromagnet (3), the area being equal to or more than a cross-sectional area within an inner perimeter of a coil (32).
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公开(公告)号：US20190067578A1
公开(公告)日：2019-02-28
申请号：US15750616
申请日：2017-08-31
发明人： Katsuhiko KISHIMOTO , Susumu SAKIO
CPC分类号： H01L51/0011 , B23K11/11 , B23K26/0622 , B23K26/08 , B23K26/22 , B23K2101/36 , B23K2103/18 , B23K2103/26 , C23C14/042 , H01L27/3244 , H01L51/56
摘要： A step of forming openings in a mask substrate includes step A of forming openings of “a” number of continual columns included in a first region (R1) including at least the (n/2)th column or the ((n+1)/2)th column; step B of forming openings of “b” number of continual columns included in a second region (R2) adjacent to the first region (R1) in a −x direction with a first gap region (RS1) being sandwiched between the first and second regions, the first gap region including “sa” number of continual columns; and step C of forming openings of “c” number of continual columns included in a third region (R3) adjacent to the first region (R1) in an x direction with a second gap region (RS2) being sandwiched between the first and third regions, the second gap region including “sb” number of continual columns. The steps B and C are performed after the step A.
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