公开(公告)号：US20240044001A1

公开(公告)日：2024-02-08

申请号：US18336207

申请日：2023-06-16

Applicant: Samsung Display Co., LTD.

Inventor： YOUNGSUN CHO ,  JUNHYEUK KO ,  MYUNGKYU KIM ,  YOUNG KWANG LEE ,  Seung Min JIN ,  Jae Min HONG

IPC: C23C16/458 ,  C23C16/04

CPC classification number: C23C16/458 ,  C23C16/042

Abstract: A deposition apparatus according to an embodiment includes a deposition source, and a deposition portion that faces the deposition source. The deposition portion is disposed at an angle of about 4 degrees to about 14 degrees with respect to an imaginary vertical line that is perpendicular to ground. The deposition portion includes a frame including an opening, and an outer portion disposed around the opening, a substrate disposed on a first side of the frame, and a plurality of back stages disposed on a second side opposite to the first side of the frame. The frame moves by movement of the plurality of back stages.

公开(公告)号：US20220290288A1

公开(公告)日：2022-09-15

申请号：US17513203

申请日：2021-10-28

Applicant: Samsung Display Co., LTD.

Inventor： Jae Min HONG ,  Jong Hyoek RYU ,  Seung Min JIN

IPC: C23C14/04 ,  C23C14/56 ,  H01L27/32

Abstract: A magnet assembly includes a support plate and a plurality of magnets which are removably fixed to the support plate and applies a magnetic force to a deposition mask. Each magnet among the plurality of magnets include a first surface facing the support plate, a second surface opposite to the first surface and facing the deposition mask, and a magnet groove defined therein.

公开(公告)号：US20220219208A1

公开(公告)日：2022-07-14

申请号：US17477038

申请日：2021-09-16

Applicant: Samsung Display Co., LTD.

Inventor： Jai Phoong KIM ,  Hyuk KANG ,  Chang Uk AN ,  Jae Min HONG

IPC: B08B3/08 ,  B08B3/04 ,  B08B3/14 ,  H01L51/56 ,  H01L51/00

Abstract: Provided are a deposition mask cleaning apparatus and a deposition mask cleaning method. The deposition mask cleaning apparatus includes a treated water bath containing treated water in which a deposition mask is immersed; a treated water generation part supplying the treated water to the treated water bath; a treated water supply pipe connecting the treated water bath and the treated water generation part; and a bubble generation part disposed in the treated water supply pipe and generating bubbles in the treated water. The treated water includes at least one of ozone water, hydrogen water, ammonia hydrogen water, and carbonated water. The bubbles include at least one of microbubbles having a bubble diameter of about 50 μm or less and nanobubbles having a bubble diameter of about 1 μm or less.

公开(公告)号：US20160248049A1

公开(公告)日：2016-08-25

申请号：US14874241

申请日：2015-10-02

Applicant: Samsung Display Co., Ltd.

Inventor： Jae Min HONG ,  Jung-Hoon KIM ,  Hong Ryul KIM ,  Suk Beom YOU ,  Sang Min YI ,  Young-Geun CHO

IPC: H01L51/56 ,  C23C14/35 ,  H01L51/00

CPC classification number: C23C14/562 ,  C23C14/042 ,  H01L51/001 ,  H01L51/0011

Abstract: A deposition apparatus comprises a chamber, a deposition material supplier positioned in the chamber and configured to contain and supply a deposition material, a substrate holder disposed in the chamber and configured to hold a substrate such that a major surface of the substrate faces the deposition material supplier; and a mask retainer disposed in the chamber and configured to retain a mask disposed over the major surface of the substrate. The mask retainer comprises a base, and a plurality of magnets coupled to the base, at least one of the plurality of magnets being movable with respect to the base, the plurality of magnets being configured to apply magnetic force to the mask such that the mask is fixed to the substrate without substantial movement of the mask with respect to the substrate during deposition of the deposition material.

Abstract translation: 沉积设备包括室，沉积材料供应器，其位于室中并且构造成容纳和供应沉积材料;衬底保持器，其设置在室中并且构造成保持衬底，使得衬底的主表面面向沉积材料 供应商 以及掩模保持器，其设置在所述室中并且被配置为保持设置在所述基板的主表面上方的掩模。 掩模保持器包括基部和耦合到基部的多个磁体，多个磁体中的至少一个相对于基座可移动，多个磁体被配置为向掩模施加磁力，使得掩模 在沉积材料沉积期间固定到基底上而不会使掩模相对于基底基本上移动。