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公开(公告)号：US20220212291A1
公开(公告)日：2022-07-07
申请号：US17503363
申请日：2021-10-18
Applicant: Samsung Display Co., LTD.
Inventor： Akifumi Sangu , Je Kil Ryu , Cheol Ho Park , Hae Sook Lee , Jin Hong Jeun , Young Su Chae , Gyoo Wan Han
Abstract: A laser crystallization apparatus according to an embodiment includes a light source unit irradiating a laser beam; and an optical unit to which the laser beam is incident, wherein the optical unit includes a first portion and a second portion bonded to each other on a bonded surface, and a first width of the first portion and a second width of the second portion are the same as each other on the bonded surface based on a direction parallel to the incident direction of the laser beam.
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公开(公告)号：US20140178605A1
公开(公告)日：2014-06-26
申请号：US13918553
申请日：2013-06-14
Applicant: Samsung Display Co., Ltd.
Inventor： Won Yong Kim , Jin Hong Jeun
IPC: C23C16/04
CPC classification number: H01L51/001 , B05D1/60 , B05D3/06 , C23C14/04 , C23C14/042 , C23C14/046 , C23C14/048 , C23C14/24 , H01L51/0013 , H01L51/56
Abstract: A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.
Abstract translation: 沉积装置包括真空室，设置在真空室中的基板，沉积源，设置在真空室中并面向基板以在基板上提供沉积材料，产生第一激光束的激光振荡器和光学单元 连接到真空室的第一侧并且分裂第一激光束以产生多个掩模激光束。 将掩模激光束照射到真空室中以设置在基板和沉积源之间。 与掩模激光束接触的沉积材料被氧化，并且通过掩模激光束的沉积材料沉积在衬底上。
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公开(公告)号：US09935268B2
公开(公告)日：2018-04-03
申请号：US15270762
申请日：2016-09-20
Applicant: Samsung Display Co., Ltd.
Inventor： Won Yong Kim , Jin Hong Jeun
CPC classification number: H01L51/001 , B05D1/60 , B05D3/06 , C23C14/04 , C23C14/042 , C23C14/046 , C23C14/048 , C23C14/24 , H01L51/0013 , H01L51/56
Abstract: A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.
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公开(公告)号：US20170012200A1
公开(公告)日：2017-01-12
申请号：US15270762
申请日：2016-09-20
Applicant: Samsung Display Co., Ltd.
Inventor： Won Yong Kim , Jin Hong Jeun
CPC classification number: H01L51/001 , B05D1/60 , B05D3/06 , C23C14/04 , C23C14/042 , C23C14/046 , C23C14/048 , C23C14/24 , H01L51/0013 , H01L51/56
Abstract: A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.
Abstract translation: 沉积装置包括真空室，设置在真空室中的基板，沉积源，设置在真空室中并面向基板以在基板上提供沉积材料，产生第一激光束的激光振荡器和光学单元 连接到真空室的第一侧并且分裂第一激光束以产生多个掩模激光束。 将掩模激光束照射到真空室中以设置在基板和沉积源之间。 与掩模激光束接触的沉积材料被氧化，并且通过掩模激光束的沉积材料沉积在衬底上。
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