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公开(公告)号:US20210143015A1
公开(公告)日:2021-05-13
申请号:US16907029
申请日:2020-06-19
Applicant: Samsung Display Co., Ltd.
Inventor: Hiroshi OKUMURA , Jong Jun BAEK , Byung Soo SO
IPC: H01L21/268 , B23K26/06 , H01L21/02
Abstract: A laser irradiation apparatus includes: a laser module configured to emit a laser beam; a first optical system configured to scan the laser beam emitted from the laser module along a first direction; an optical element configured to refract the laser beam emitted from the first optical system; and a substrate supporter on which a base substrate to which the laser beam refracted through the optical element reaches is arranged.
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公开(公告)号:US20200051835A1
公开(公告)日:2020-02-13
申请号:US16535021
申请日:2019-08-07
Applicant: Samsung Display Co., Ltd.
Inventor: Byung Soo SO , In Cheol KO , Jong Jun BAEK , Jae Woo JEONG
Abstract: An annealing apparatus includes: a main body configured to receive a substrate; a microwave generating unit configured to generate microwaves to be transmitted to the main body; an incidence unit configured to transmit the microwaves from the microwave generating unit to the main body; and a diffraction unit disposed between the incident unit and the main body. The diffraction unit is configured to pass the microwaves therethrough before they are transmitted to the main body.
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公开(公告)号:US20240237438A1
公开(公告)日:2024-07-11
申请号:US18430632
申请日:2024-02-01
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Bo Geon JEON , Min Suk KO , Jong Jun BAEK
IPC: H10K59/131 , H10K59/12 , H10K59/121
CPC classification number: H10K59/131 , H10K59/121 , H10K59/1201
Abstract: A display device includes: a base layer including a first surface, and a second surface; a plurality of pixels on the first surface; and a plurality of first lines on the first surface. The base layer includes: a first base layer; an etch stop layer on the first base layer; a plurality of second lines on the etch stop layer; and a second base layer on the etch stop layer and the second lines. The first base layer, the etch stop layer, the second lines, and the second base layer are sequentially stacked, and the first lines are electrically connected to the second lines through first contact holes.
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公开(公告)号:US20220199721A1
公开(公告)日:2022-06-23
申请号:US17471055
申请日:2021-09-09
Applicant: Samsung Display Co., Ltd.
Inventor: Jong Jun BAEK , Jong Oh Seo
IPC: H01L27/32 , H01L29/66 , H01L29/786
Abstract: A method of manufacturing a polycrystalline silicon layer, includes forming an amorphous silicon layer on a substrate; doping the amorphous silicon layer with at least one impurity; cleaning the amorphous silicon layer with hydrofluoric acid; rinsing the amorphous silicon layer with hydrogen-added deionized water; and forming a polycrystalline silicon layer by irradiating a laser beam onto the amorphous silicon layer.
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公开(公告)号:US20190088794A1
公开(公告)日:2019-03-21
申请号:US15919419
申请日:2018-03-13
Applicant: Samsung Display Co., Ltd.
Inventor: Jae Woo JEONG , In Cheol KO , Jong Jun BAEK
IPC: H01L29/786 , H01L21/02 , H01L27/12 , H01L27/32 , H01L29/417 , G09G3/3208
Abstract: A display device includes: a substrate including a display area at which an image is displayed with light; and a switching element on the substrate in the display area thereof. The switching element includes: a semiconductor layer; a first gate electrode; a second gate electrode connected to the first gate electrode; a fluorine-doped first insulating layer between the first gate electrode and semiconductor layer; and a fluorine-doped second insulating layer between the second gate electrode and the semiconductor layer.
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公开(公告)号:US20240268151A1
公开(公告)日:2024-08-08
申请号:US18515270
申请日:2023-11-21
Applicant: Samsung Display Co., LTD.
Inventor: Jong Oh SEO , Jong Jun BAEK
IPC: H10K59/121 , H10K59/12
CPC classification number: H10K59/1213 , H10K59/1201
Abstract: A display device includes a light-emitting device; a first transistor that outputs a driving current applied to the light-emitting device; a second transistor that transmits a data voltage to a first electrode of the first transistor; and a third transistor electrically connected to a second electrode and a gate electrode of the first transistor, a first semiconductor layer of the first transistor includes fluorine ions, a third semiconductor layer of the third transistor includes a third lower doping layer and a third upper doping layer sequentially disposed, a concentration of phosphorus ions of the third lower doping layer is greater than a concentration of phosphorus ions of the third upper doping layer, and a concentration of boron ions of the third upper doping layer is greater than a concentration of boron ions of the third lower doping layer.
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公开(公告)号:US20240032339A1
公开(公告)日:2024-01-25
申请号:US18118190
申请日:2023-03-07
Applicant: Samsung Display Co., LTD.
Inventor: Hiroshi OKUMURA , Jong Hoon CHOI , Jong Jun BAEK
IPC: H10K59/121 , H10K59/12 , H01L29/786 , H01L29/423 , H01L29/417 , H01L29/66
CPC classification number: H10K59/1213 , H10K59/1201 , H01L29/78696 , H01L29/42384 , H01L29/41733 , H01L29/78663 , H01L29/78672 , H01L29/6675
Abstract: A display device includes an active layer disposed on a substrate, the active layer including a channel region and a first conductive region, the first conductive region including a first sub-conductive region disposed on a first side of the channel region, and a second sub-conductive region disposed between the first sub-conductive region and the channel region. The first conductive region further includes a first doped layer disposed on the substrate in the first sub-conductive region, a second doped layer disposed on the first doped layer in the first sub-conductive region, disposed on the substrate in the second sub-conductive region, and a third doped layer disposed on the second doped layer in the first sub-conductive region and the second sub-conductive region.
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公开(公告)号:US20220173196A1
公开(公告)日:2022-06-02
申请号:US17307906
申请日:2021-05-04
Applicant: Samsung Display Co., Ltd.
Inventor: Bo Geon JEON , Min Suk KO , Jong Jun BAEK
IPC: H01L27/32
Abstract: A display device includes: a base layer including a first surface, and a second surface; a plurality of pixels on the first surface; and a plurality of first lines on the first surface. The base layer includes: a first base layer; an etch stop layer on the first base layer; a plurality of second lines on the etch stop layer; and a second base layer on the etch stop layer and the second lines. The first base layer, the etch stop layer, the second lines, and the second base layer are sequentially stacked, and the first lines are electrically connected to the second lines through first contact holes.
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公开(公告)号:US20220077261A1
公开(公告)日:2022-03-10
申请号:US17338738
申请日:2021-06-04
Applicant: Samsung Display Co., Ltd.
Inventor: Jong Oh SEO , Jong Jun BAEK
Abstract: An embodiment provides a manufacturing method of a polycrystalline silicon layer, including: forming a first amorphous silicon layer on a substrate; doping an N-type impurity into the first amorphous silicon layer; forming a second amorphous silicon layer on the n-doped first amorphous silicon layer; doping a P-type impurity into the second amorphous silicon layer; and crystalizing the n-doped first amorphous silicon layer and the p-doped second amorphous silicon layer by irradiating a laser beam onto n-doped first amorphous silicon layer and the p-doped second amorphous silicon layer to form a polycrystalline silicon layer.
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