Abstract:
A display device includes: a substrate including a display area at which an image is displayed with light; and a switching element on the substrate in the display area thereof. The switching element includes: a semiconductor layer; a first gate electrode; a second gate electrode connected to the first gate electrode; a fluorine-doped first insulating layer between the first gate electrode and semiconductor layer; and a fluorine-doped second insulating layer between the second gate electrode and the semiconductor layer.
Abstract:
Provided is a manufacturing method of a thin film transistor array panel including: formation of a gate line including a gate electrode on a substrate; formation of sequentially a gate insulating layer, an active layer, a data metal layer, and a photoresist etching mask pattern on the gate line; etching the data metal layer with the same shape as the photoresist etching mask pattern; etching the active layer by using the photoresist etching mask pattern; formation of a data line including a source electrode and a drain electrode for completing a channel region on the active layer; and formation of a pixel electrode exposing the drain electrode and electrically connected with the drain electrode, in which in the etching of the active layer, a dry-etch process is performed by using gas including at least one of NF3 and H2.
Abstract:
Provided is a method for manufacturing a glycol based compound. The method comprises agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound, and performing fractional distillation of resultant materials of the agitating to recover a second glycol based compound having a formaldehyde content of 0 ppm.
Abstract:
A transistor substrate includes a substrate, a semiconductor layer overlapping the substrate, and a gate electrode overlapping the semiconductor layer. The semiconductor layer includes a channel unit, a conductive unit directly connected to an end of the channel unit, and an edge unit positioned at an edge of the conductive unit. A carbon concentration of the edge unit is higher than each of a carbon concentration of the channel unit and a carbon concentration of the conductive unit.
Abstract:
An annealing apparatus includes: a main body configured to receive a substrate; a microwave generating unit configured to generate microwaves to be transmitted to the main body; an incidence unit configured to transmit the microwaves from the microwave generating unit to the main body; and a diffraction unit disposed between the incident unit and the main body. The diffraction unit is configured to pass the microwaves therethrough before they are transmitted to the main body.
Abstract:
A touch sensor according to an exemplary embodiment includes: a substrate; a first sense electrode that is disposed on the substrate and extends in a first direction; a first insulation layer that covers the substrate and the first sense electrode; and a second sense electrode that is disposed in the first insulation layer and extends in a second direction that crosses the first direction, wherein an upper surface of the second sense electrode is disposed on the same plane as an upper surface of the first insulation layer.
Abstract:
A metal wire etchant including persulfate, a sulfonate, a fluorine compound, an azole-based compound, an organic acid, a nitrate, and a chlorine compound, and a method of making the same.