公开(公告)号：US20200328237A1

公开(公告)日：2020-10-15

申请号：US16808157

申请日：2020-03-03

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-min LEE ,  Ji-Hwan KIM ,  Jongoh SEO ,  Byung Soo SO ,  Dong-Sung LEE ,  Jonghoon CHOI

IPC: H01L27/12 ,  H01L21/02

Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.

公开(公告)号：US20200152723A1

公开(公告)日：2020-05-14

申请号：US16677042

申请日：2019-11-07

Applicant: Samsung Display Co., Ltd.

Inventor： Jongoh SEO ,  In Cheol KO ,  Byung Soo SO ,  Dong-min LEE ,  Dong-Sung LEE

IPC: H01L27/32 ,  H01L51/56 ,  H01L51/00

Abstract: A display device may include a substrate, a first layer on the substrate, the first layer including a first portion having a first thickness and a second portion having a second thickness greater than the first thickness, a second layer on the first layer, an active pattern on the second layer, the active pattern overlapping only the first portion of the first layer, a gate electrode on the active pattern, a source electrode and a drain electrode on the gate electrode and connected to the active pattern, a first electrode connected to one of the source electrode and the drain electrode, a pixel defining layer on the first electrode, the pixel defining layer having an opening portion exposing at least a portion of the first electrode, an emission layer in the opening portion on the first electrode, and a second electrode on the emission layer.

公开(公告)号：US20200171600A1

公开(公告)日：2020-06-04

申请号：US16698842

申请日：2019-11-27

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-Sung LEE ,  Dong-min LEE ,  Jongoh SEO ,  Byung Soo SO

IPC: B23K26/04 ,  B23K26/0622 ,  H01L21/20 ,  H01L21/02

Abstract: A laser crystallizing apparatus may include a laser light source, an optical system, and an optical module. The laser light source may generate a laser beam. The optical system may convert the laser beam into a line laser beam. The optical module may disperse energy of the line laser beam in a first direction for generating a dispersed line laser beam. The first direction may be perpendicular to a lengthwise direction of the optical module.

公开(公告)号：US20210296374A1

公开(公告)日：2021-09-23

申请号：US17030977

申请日：2020-09-24

Applicant: Samsung Display Co., Ltd.

Inventor： Jongoh SEO ,  Gyungmin BAEK ,  Byungsoo SO

IPC: H01L27/12 ,  H01L29/786 ,  H01L29/66 ,  H01L21/02

Abstract: A manufacturing method of a display apparatus including preparing a substrate, forming an amorphous silicon layer on the substrate, cleaning the amorphous silicon layer with hydrofluoric acid, crystallizing the amorphous silicon layer into a polycrystalline silicon layer, and forming a metal layer directly on the polycrystalline silicon layer.

公开(公告)号：US20200303424A1

公开(公告)日：2020-09-24

申请号：US16821484

申请日：2020-03-17

Applicant: Samsung Display Co., LTD.

Inventor： Dong-Sung LEE ,  Jongoh SEO ,  Byung Soo SO ,  Dong-min LEE ,  Yeon Hee JEON ,  Jonghoon CHOI

IPC: H01L27/12 ,  H01L29/786 ,  H01L29/04 ,  H01L21/02

Abstract: A display device may include a thin film transistor disposed on a substrate, and a display element electrically connected to the thin film transistor. The thin film transistor may include an active pattern including polycrystalline silicon, a gate insulation layer disposed on the active pattern, and a gate electrode disposed on the gate insulation layer. An average value of grain sizes of the active pattern may be in a range of about 400 nm to about 800 nm. An RMS value of a surface roughness of the active pattern may be about 4 nm or less. A method of manufacturing a polycrystalline silicon layer may include cleaning an amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam having an energy density of about 440 mJ/cm2 to about 490 mJ/cm2.

公开(公告)号：US20220173134A1

公开(公告)日：2022-06-02

申请号：US17672574

申请日：2022-02-15

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-min LEE ,  Ji-Hwan KIM ,  Jongoh SEO ,  Byung Soo SO ,  Dong-Sung LEE ,  Jonghoon CHOI

IPC: H01L27/12 ,  H01L21/02 ,  B23K26/53 ,  H01S3/00 ,  G02B27/12

Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.

公开(公告)号：US20210057218A1

公开(公告)日：2021-02-25

申请号：US16997454

申请日：2020-08-19

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-Min LEE ,  Ji-Hwan KIM ,  Jongoh SEO ,  Byung Soo SO

IPC: H01L21/02 ,  H01L21/268 ,  H01L21/67

Abstract: A laser annealing device includes a stage, a laser generator, and a reflective member. The stage supports a substrate with a thin film formed thereon to be processed, and may be moved in a first direction at a set or predetermined speed. The laser generator irradiates a first area of the thin film with a laser beam while the stage is moved. The reflective member reflects a part of the laser beam, which is reflected from the first area of the thin film, to a second area of the thin film. The first area and the second area are spaced apart from each other.