CHEMICAL VAPOR DEPOSITION SYSTEM
    1.
    发明申请

    公开(公告)号:US20180340258A1

    公开(公告)日:2018-11-29

    申请号:US15990051

    申请日:2018-05-25

    Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a down-side surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.

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