公开(公告)号：US20220085341A1

公开(公告)日：2022-03-17

申请号：US17308671

申请日：2021-05-05

Applicant: Samsung Display Co., LTD.

Inventor： Dae Soo KIM ,  Sang Gab KIM ,  Yun Jong YEO ,  Ju Hee LEE ,  Soo Beom JO ,  Dae Won CHOI

IPC: H01L51/56 ,  H01L27/32 ,  H01L51/00 ,  H01J37/32

Abstract: An etching device includes a chamber; a stage disposed in the chamber and on which a target substrate is loaded; a gas distribution unit disposed to face the stage in the chamber; a plurality of plasma generation modules disposed above the chamber; a gas supply unit that supplies gas into the chamber; a gas line connecting the gas supply unit and the plurality of plasma generation modules; and a plurality of gas inlet pipes each including an end connected to the plasma generation module and another end connected to the gas distribution unit.

公开(公告)号：US20190214233A1

公开(公告)日：2019-07-11

申请号：US16172863

申请日：2018-10-29

Applicant: Samsung Display Co., Ltd.

Inventor： Soo Beom JO ,  Hae Young YOO ,  Ju Hee LEE ,  Yong Mun CHANG ,  Myung Soo HUH

IPC: H01J37/32 ,  H01L21/3065

CPC classification number: H01J37/32238 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/3222 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32724 ,  H01J37/32834

Abstract: A plasma processing device including a chamber, a plurality of dielectric windows covering a top portion of the chamber, a lid frame supporting the dielectric windows on a same plane, a plurality of supporting bars supporting a top portion of the lid frame, and a plurality of antennas positioned above the dielectric windows, in which the antennas include a first antenna positioned inside an area defined by the supporting bars and having a loop form, and a second antenna positioned outside the area defined by the supporting bars and having a loop form, and a first current direction in the first antenna and a second current direction in the second antenna are the same as each other.

公开(公告)号：US20230311404A1

公开(公告)日：2023-10-05

申请号：US17989758

申请日：2022-11-18

Applicant: Samsung Display Co., LTD.

Inventor： Kangwon LEE ,  Soo Beom JO ,  Dong Kyun KO ,  Kyungjoo MIN ,  Eun Chan LIM ,  Myung Soo HUH

IPC: B29C59/00 ,  B29C59/04

CPC classification number: B29C59/002 ,  B29C59/046

Abstract: An imprint device according to an embodiment includes: a stage, which supports a substrate; a press roller, which presses a film with respect to the substrate; a first load cell and a second load cell, which are disposed corresponding to opposite ends of the press roller, respectively; and a controller, which monitors a release state of the film based on an output of the first load cell and an output of the second load cell.