公开(公告)号：US20230144827A1

公开(公告)日：2023-05-11

申请号：US17984500

申请日：2022-11-10

Applicant: Samsung Display Co., LTD.

Inventor： Choelmin JANG ,  Junggon KIM ,  Min-Gyu PARK ,  Heeyong LEE ,  Eun JUNG ,  Myungsoo HUH

IPC: B05C11/10 ,  B05C5/02 ,  B05C15/00 ,  B05B15/65 ,  B05B15/70 ,  B05B15/62

CPC classification number: B05C11/1044 ,  B05C5/0287 ,  B05C11/1039 ,  B05C15/00 ,  B05B15/65 ,  B05B15/70 ,  B05B15/62

Abstract: A substrate processing apparatus may include a chamber having a working space, maintaining a vacuum state, and including an upper wall positioned on the working space, a nozzle assembly positioned in the working space, and including nozzles, and a lifting module including a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.