CHEMICAL VAPOR DEPOSITION SYSTEM
    6.
    发明申请

    公开(公告)号:US20180340258A1

    公开(公告)日:2018-11-29

    申请号:US15990051

    申请日:2018-05-25

    Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a down-side surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.

    VAPOR DEPOSITION APPARATUS AND METHOD
    7.
    发明申请
    VAPOR DEPOSITION APPARATUS AND METHOD 审中-公开
    蒸气沉积装置和方法

    公开(公告)号:US20160168707A1

    公开(公告)日:2016-06-16

    申请号:US14736337

    申请日:2015-06-11

    Abstract: A vapor deposition apparatus includes a deposition unit having a plurality of nozzle parts sequentially arranged in a first direction and a plurality of exhaustion parts alternately arranged with the plurality of nozzle parts, a substrate mounting unit on which a substrate is mounted and which is reciprocally movable a plurality of times below the deposition unit along a straight line parallel to the first direction, and a control unit that controls movement of the substrate mounting unit. A start point of a reciprocal movement of the substrate mounting unit is variable for each reciprocal movement.

    Abstract translation: 一种蒸镀装置,具备:具有沿着第一方向依次排列的多个喷嘴部和与上述多个喷嘴部交替配置的多个排气部的沉积部,具备基板安装部的基板安装部, 沿着与第一方向平行的直线沉积单元下方多次;以及控制单元,其控制基板安装单元的移动。 基板安装单元的往复移动的起始点对于每个往复运动是可变的。

    DEPOSITION APPARATUS AND DEPOSITION METHOD USING DEPOSITION APPARATUS

    公开(公告)号:US20190226084A1

    公开(公告)日:2019-07-25

    申请号:US16254699

    申请日:2019-01-23

    Abstract: A deposition apparatus includes: a vacuum chamber in which a deposition process is performable; connected to the vacuum chamber: vaporizers in which are vaporizable different deposition materials; and a mixing chamber in which the vaporized different deposition materials are mixable; and within the vacuum chamber: a substrate support on which is supportable a substrate on which the mixed vaporized different deposition materials are deposited in the deposition process; and a spray nozzle which is connected to the mixing chamber and from which the mixed vaporized different deposition materials are sprayable to the substrate in the deposition process. The spray nozzle includes nozzles arranged in a plurality of lines.

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