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公开(公告)号:US20230227971A1
公开(公告)日:2023-07-20
申请号:US18080935
申请日:2022-12-14
发明人: JONGBUN HAN , JUHEE LEE , Suk Won JUNG , Sang Jin HAN
CPC分类号: C23C16/4405 , H01J37/32449 , H01J37/32862 , H01J37/32816 , B08B5/00 , B08B13/00 , H01J2237/24585 , H01J2237/186 , H01J37/32633 , H01J2237/182
摘要: An embodiment provides a deposition apparatus, including: a process chamber; a residual gas analyzer connected to the process chamber; a cleansing gas supplier connected to the process chamber; and a driver that is connected to the residual gas analyzer and the cleansing gas supplier and controls the residual gas analyzer and the cleansing gas supplier.