公开(公告)号：US20210043661A1

公开(公告)日：2021-02-11

申请号：US16927327

申请日：2020-07-13

申请人： Samsung Display Co., LTD. ,  UBmaterials lnc.

发明人： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC分类号： H01L27/12 ,  H01L21/3105 ,  C09G1/02 ,  C09K3/14

摘要： A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.