DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:US20220059630A1

    公开(公告)日:2022-02-24

    申请号:US17317695

    申请日:2021-05-11

    Abstract: A display device includes a substrate, an active pattern disposed on the substrate, a gate electrode overlapping the active pattern, an inorganic insulation layer covering the active pattern, a source metal pattern and an etch-delaying pattern. The source metal pattern includes a first portion that is disposed on the inorganic insulation layer, and a second portion that passes through the inorganic insulation layer and electrically contacts the active pattern. The etch-delaying pattern is disposed between the active pattern and the first portion of the source metal pattern, contacts the second portion of the source metal pattern, and includes a different material from the inorganic insulation layer.

    DISPLAY DEVICE AND MANUFACTURING METHOD FOR SAME

    公开(公告)号:US20240389386A1

    公开(公告)日:2024-11-21

    申请号:US18656470

    申请日:2024-05-06

    Abstract: A display device is disclosed that includes a base layer, a light-emitting element, and a pixel circuit. The pixel circuit includes a first transistor, and the first transistor includes a metal oxide semiconductor pattern, a first gate having a plurality of conductive layers, and a gate insulation pattern. The uppermost layer among the plurality of conductive layers is divided into a first part adjacent to a drain region, a second part adjacent to a source region, and a third part between the first part and the second part. An upper surface of each of the first part and the second part may form a step with an upper surface of the third part. A sum of the widths of the upper surfaces of the first part and the second part may be smaller than the width of the upper surface of the third part.

    DISPLAY DEVICE
    4.
    发明申请

    公开(公告)号:US20230055419A1

    公开(公告)日:2023-02-23

    申请号:US17888604

    申请日:2022-08-16

    Abstract: A display device includes a display area, a pixel circuit area adjacent to the display area, and a functional module area between the display area and the pixel circuit area. An inorganic insulating layer is in the display area. A light phase compensation layer is in the functional module area and includes a same material as the inorganic insulating layer. A signal line is disposed in the functional module area, on the light phase compensation layer, and extends from the functional module area to the pixel circuit area. The organic insulating layer is on the inorganic insulating layer and extends from the display area to the functional module area to cover the signal line and the light phase compensation layer.

    DISPLAY PANEL, THIN FILM TRANSISTOR INCLUDED IN THE SAME, AND MANUFACTURING METHOD OF THE SAME

    公开(公告)号:US20240172546A1

    公开(公告)日:2024-05-23

    申请号:US18470254

    申请日:2023-09-19

    CPC classification number: H10K71/231 H10K59/1201 H10K59/124

    Abstract: A method for manufacturing a display panel is provided, the method including forming a semiconductor pattern on a base layer, applying at least one insulation layer on the semiconductor pattern, and applying a control electrode on the insulation layer so as to overlap at least a portion of the semiconductor pattern. The applying of the control electrode includes depositing molybdenum to form a preliminary electrode layer, forming a photoresist pattern on the preliminary electrode layer, and applying an etching gas to dry-etch the preliminary electrode layer. In an embodiment, in the dry-etching, the etching gas may include a nitrogen trifluoride gas, an oxygen gas, and a chlorine gas. Accordingly, it is possible to implement a manufacturing process of an eco-friendly display panel while increasing the yield and reliability of the display panel manufacturing process.

    DISCHARGE METHOD, DISCHARGE SYSTEM AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20230052781A1

    公开(公告)日:2023-02-16

    申请号:US17864540

    申请日:2022-07-14

    Abstract: A discharge method includes discharging discharge products including a first discharge gas and solid by-products from a process chamber, in which a substrate processing process is performed in a vacuum state, into an inside of a collection device, collecting the solid by-products in the collection device, introducing a portion of a second discharge gas discharged from a load lock chamber into the collection device, and vaporizing the solid by-products in the collection device and discharging vaporized solid by-products to an outside of the collection device.

    PLASMA POST-PROCESSING APPARATUS AND PLASMA POST-PROCESSING METHOD USING THE SAME

    公开(公告)号:US20240062992A1

    公开(公告)日:2024-02-22

    申请号:US18327211

    申请日:2023-06-01

    CPC classification number: H01J37/3244 H01L21/32136 H01J2237/334

    Abstract: Disclosed is a plasma post-processing apparatus including a chamber, a stage disposed inside of the chamber, a work substrate disposed on the stage, diffusers each of which increases in width in a direction away from the work substrate and having holes, and disposed above the stage, transfer pipes respectively connected to the diffusers, and plasma generators respectively connected to pipes that supply process gases and are respectively connected to the transfer pipes, and a diameter of the holes defined in a diffuser disposed at a center of the work substrate among the diffusers is less than a diameter of holes defined in each of remaining diffusers among the diffusers.

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