EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME
    3.
    发明申请
    EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME 有权
    曝光装置和曝光方法

    公开(公告)号:US20150227056A1

    公开(公告)日:2015-08-13

    申请号:US14453040

    申请日:2014-08-06

    CPC classification number: G03F7/70191 G02F1/1303 G02F1/133788

    Abstract: An exposure apparatus including a substrate transporting unit configured to transport a substrate in a first direction, and including a first measuring part; and an exposure part disposed over the substrate transporting unit configured to irradiate the substrate with ultraviolet rays. The first measuring part is configured to measure an intensity of the ultraviolet rays before the substrate is irradiated.

    Abstract translation: 一种曝光装置,包括:基板传送单元,被配置为沿第一方向传送基板,并且包括第一测量部; 以及设置在所述基板输送单元上的曝光部,所述曝光部被构造成用紫外线照射所述基板。 第一测量部件被配置为在照射基板之前测量紫外线的强度。

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