DRIVING BACKPLANE AND PREPARATION METHOD THEREFOR, AND DISPLAY APPARATUS

    公开(公告)号:US20240347550A1

    公开(公告)日:2024-10-17

    申请号:US18755700

    申请日:2024-06-27

    CPC classification number: H01L27/1251 H01L27/1222 H01L27/124 H01L27/127

    Abstract: A method for preparing a driving backplane includes: providing a base substrate, forming a connecting layer on a side of the base substrate; forming an insulating layer group on a side of the connecting layer away from the base substrate, forming a first via hole by patterning the insulating layer group; forming inducing particles on a side of the insulating layer group away from the base substrate; forming a doped amorphous silicon layer on a side of the inducing particles away from the base substrate, forming a first conductor part by the doped amorphous silicon layer formed in the first via hole, forming a raw material part by patterning the doped amorphous silicon layer; and forming a first channel part by causing the inducing particles to induce the raw material part, wherein the first channel part is connected to the first conductor part.

    PREPARATION METHOD FOR ARRAY SUBSTRATE AND PREPARATION METHOD FOR DISPLAY PANEL

    公开(公告)号:US20240234440A1

    公开(公告)日:2024-07-11

    申请号:US18558740

    申请日:2022-07-01

    CPC classification number: H01L27/124 H01L27/127

    Abstract: Disclosed is a preparation method for an array substrate including: forming a first conductive portion on a substrate; sequentially forming a first insulating layer, a second insulating layer and a third insulating layer on the side of the first conductive portion that faces away from the substrate; forming, through one-time patterning process, a first sub-via that penetrates through the third insulating layer, the second insulating layer and a first part of the first insulating layer; forming a fourth insulating layer on the side of the third insulating layer that faces away from the substrate; etching and removing the fourth insulating layer and the first insulating layer of the second thickness that are at the first sub-via, so as to form a first via; and forming a first connection electrode on the side of the fourth insulating layer that faces away from the substrate.

    GATE-ALL-AROUND DEVICES WITH DIFFERENT GATE OXIDE THICKNESSES

    公开(公告)号:US20240186327A1

    公开(公告)日:2024-06-06

    申请号:US18074814

    申请日:2022-12-05

    Abstract: Techniques are provided herein to form semiconductor devices having different gate oxide thicknesses. A first semiconductor device includes a first gate structure around a first plurality of semiconductor nanoribbons and a second semiconductor device includes a second gate structure around a second plurality of semiconductor nanoribbons. The first gate structure includes at least a first gate oxide layer and a first gate electrode, and the second gate structure includes at least a second gate oxide layer and a second gate electrode. The first gate oxide layer is thicker than the second gate oxide layer. A high-k dielectric layer may be formed over the first and second gate oxide layers or may be formed over the second gate oxide layer, but not over the first gate oxide layer.

    ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE ARRAY SUBSTRATE AND DISPLAY PANEL

    公开(公告)号:US20240178238A1

    公开(公告)日:2024-05-30

    申请号:US17789505

    申请日:2021-06-24

    CPC classification number: H01L27/1244 H01L27/1222 H01L27/1251 H01L27/127

    Abstract: An array substrate includes: a base; gate lines and data lines on the base; multiple pixel units each including a thin film transistor; first and second conductive layers with a first insulating layer therebetween. The first conductive layer includes a first wiring pattern, the second conductive layer includes a first interconnection pattern, orthographic projections of the first wiring pattern and the first interconnection pattern on the base are at least partially overlapped. The first wiring pattern is connected with the first interconnection pattern through a via hole. Each of part of data lines is located in the first conductive layer and has an auxiliary line formed by the first interconnection pattern in the second conductive layer. The first wiring pattern includes the data lines; at least one of the data line and the first interconnection pattern is connected to a source of the thin film transistor.

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