公开(公告)号：US20160289829A1

公开(公告)日：2016-10-06

申请号：US14932742

申请日：2015-11-04

Applicant: Samsung Display Co., Ltd.

Inventor： Cheol Jang ,  Jin Koo Kang ,  Sao Youn Kim

IPC: C23C16/455 ,  C23C16/458 ,  H01L21/285 ,  H01L21/683 ,  H01L21/02

CPC classification number: C23C16/45544 ,  C23C16/04 ,  C23C16/4583 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/28556 ,  H01L21/6831

Abstract: A thin film deposition device and a method of depositing thin film materials are disclosed. In one aspect, the thin film deposition device includes a deposition chamber configured to accommodate a substrate and a first chamber plate placed in the deposition chamber and configured to mount the substrate on a first surface thereof. The thin film deposition device also includes a second chamber plate placed in the deposition chamber on the opposite side of the first chamber plate with reference to the substrate. A plurality of recesses are formed on a surface of the second chamber plate facing the first surface of the first chamber plate such that gas flow is formed through the respective recesses.

Abstract translation: 公开了薄膜沉积装置和沉积薄膜材料的方法。 在一个方面，薄膜沉积装置包括沉积室，其被配置为容纳衬底和放置在沉积室中的第一室板，并被配置为将衬底安装在其第一表面上。 薄膜沉积装置还包括相对于基板在第一室板的相对侧上放置在沉积室中的第二室板。 在第二室板的面对第一室板的第一表面的表面上形成多个凹槽，使得气流通过相应的凹槽形成。