公开(公告)号：US20160186315A1

公开(公告)日：2016-06-30

申请号：US14694631

申请日：2015-04-23

Applicant: Samsung Display Co., Ltd.

Inventor： Sung Hon CHI ,  Jin Seok Son

IPC: C23C14/58 ,  C23C14/02 ,  C23C14/34

CPC classification number: C23C16/4405 ,  C23C16/45565 ,  C23C16/45574 ,  H01J37/32357 ,  H01J37/3244

Abstract: A deposition device including a chamber configured to provide a space in which a process is performed with respect to a substrate; a substrate support arranged on a bottom side of an inner portion of the chamber and on which the substrate is seated; an upper electrode arranged above the substrate support to be spaced apart from the substrate support; a shower head arranged between the substrate support and the upper electrode and configured to come in contact with the upper electrode, and formed to jet a reaction gas or a cleaning gas in a direction of the substrate support; a reaction gas supply pipe penetrating the chamber and installed on the upper electrode; and a cleaning gas supply pipe penetrating the chamber and arranged on the upper electrode independently of the reaction gas supply pipe.

Abstract translation: 一种沉积装置，包括：室，被配置为提供相对于基板进行处理的空间; 衬底支撑件，其布置在所述腔室的内部的底侧上，并且所述衬底被放置在所述衬底支撑件上; 布置在所述基板支撑件上方以与所述基板支撑件间隔开的上电极; 淋浴头，其布置在所述基板支撑件和所述上部电极之间并且构造成与所述上部电极接触，并且形成为沿所述基板支撑件的方向喷射反应气体或清洁气体; 反应气体供给管穿透室并安装在上部电极上; 以及清洁气体供给管，该清洁气体供给管穿透所述室并且独立于所述反应气体供给管而布置在所述上​​部电极