Laser annealing apparatus and method, and display apparatus manufactured by this method
    1.
    发明授权
    Laser annealing apparatus and method, and display apparatus manufactured by this method 有权
    激光退火装置和方法以及通过该方法制造的显示装置

    公开(公告)号:US09005998B2

    公开(公告)日:2015-04-14

    申请号:US13943304

    申请日:2013-07-16

    Abstract: A laser annealing apparatus reduces laser annealing time and has a simple configuration. A laser annealing method is used to manufacture a display apparatus. The laser annealing apparatus includes a mounting unit, a substrate mounted on the mounting unit, first and second driving modules installed on the mounting unit and adjusting locations of first and second mark masks to be placed on a part of the substrate, first and second image modules that may obtain image data regarding the first and second mark masks to be location-adjusted by first and second driving modules, and a laser module that radiates a laser beam to the substrate and changes at least a part of an amorphous silicon layer of the substrate to crystalline silicon.

    Abstract translation: 激光退火装置减少激光退火时间并且具有简单的构造。 激光退火方法用于制造显示装置。 激光退火装置包括安装单元,安装在安装单元上的基板,安装在安装单元上的第一和第二驱动模块以及要放置在基板的一部分上的第一和第二标记掩模的调整位置,第一和第二图像 可以获得关于由第一和第二驱动模块进行位置调整的第一和第二标记掩模的图像数据的模块;以及激光模块,其将激光束辐射到衬底并改变至少一部分非晶硅层 底物至晶体硅。

    LASER ANNEALING APPARATUS AND METHOD, AND DISPLAY APPARATUS MANUFACTURED BY THIS METHOD
    2.
    发明申请
    LASER ANNEALING APPARATUS AND METHOD, AND DISPLAY APPARATUS MANUFACTURED BY THIS METHOD 有权
    激光退火装置和方法以及通过该方法制造的显示装置

    公开(公告)号:US20140284608A1

    公开(公告)日:2014-09-25

    申请号:US13943304

    申请日:2013-07-16

    Abstract: A laser annealing apparatus reduces laser annealing time and has a simple configuration. A laser annealing method is used to manufacture a display apparatus. The laser annealing apparatus includes a mounting unit, a substrate mounted on the mounting unit, first and second driving modules installed on the mounting unit and adjusting locations of first and second mark masks to be placed on a part of the substrate, first and second image modules that may obtain image data regarding the first and second mark masks to be location-adjusted by first and second driving modules, and a laser module that radiates a laser beam to the substrate and changes at least a part of an amorphous silicon layer of the substrate to crystalline silicon.

    Abstract translation: 激光退火装置减少激光退火时间并且具有简单的构造。 激光退火方法用于制造显示装置。 激光退火装置包括安装单元,安装在安装单元上的基板,安装在安装单元上的第一和第二驱动模块以及要放置在基板的一部分上的第一和第二标记掩模的调整位置,第一和第二图像 可以获得关于由第一和第二驱动模块进行位置调整的第一和第二标记掩模的图像数据的模块;以及激光模块,其将激光束辐射到衬底并改变至少一部分非晶硅层 底物至晶体硅。

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