公开(公告)号：US10816480B2

公开(公告)日：2020-10-27

申请号：US16364251

申请日：2019-03-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-Hee Jeang ,  Aleksandr Shorokhov ,  Anton Medvedev ,  Maksim Riabko ,  Sang-Woo Bae ,  Akinori Okubo ,  Sang-Min Lee ,  Seong-Keun Cho ,  Won-Don Joo

IPC: G01N21/88 ,  G01N21/21

Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.

公开(公告)号：US11823961B2

公开(公告)日：2023-11-21

申请号：US17021087

申请日：2020-09-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eunhee Jeang ,  Boris Afinogenov ,  Sangwoo Bae ,  Wondon Joo ,  Maksim Riabko ,  Anton Medvedev ,  Aleksandr Shorokhov ,  Anton Sofronov ,  Ingi Kim ,  Taehyun Kim ,  Minhwan Seo ,  Sangmin Lee ,  Seulgi Lee

IPC: H01L21/66 ,  H01L21/67 ,  G01N21/95 ,  G01N21/64

CPC classification number: H01L22/12 ,  G01N21/648 ,  G01N21/9505 ,  H01L21/67288 ,  G01N2201/06113

Abstract: A substrate inspection apparatus includes a light source unit, a pulsed beam matching unit, a substrate support unit, an incidence angle adjusting unit, and a detecting unit. The light source unit emits a first laser beam having a first wavelength and a second laser beam having a second wavelength. The pulsed beam matching unit matches the first laser beam and the second laser beam to superimpose a pulse of the first laser beam on a pulse of the second laser beam in time and space. The substrate support unit supports a substrate to be inspected. The incidence angle adjusting unit adjusts angles of incidence of the matched first laser beam and second laser beams to irradiate the first laser beam and the second laser beam on the substrate, and mixes the first laser beam and the second laser beam to generate an evanescent wave on the substrate. The evanescent wave generates scattered light due to a defect of the substrate. The detecting unit detects the scattered light generated due to the defect of the substrate.

公开(公告)号：US09995648B2

公开(公告)日：2018-06-12

申请号：US14850425

申请日：2015-09-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Alexey Shchekin ,  Maksim Riabko ,  Sergey Koptyaev ,  Anton Medvedev

IPC: G01B11/02 ,  G01N21/95 ,  G01M11/00 ,  G01M11/02 ,  G03F7/20

CPC classification number: G01M11/005 ,  G01B2210/56 ,  G01M11/0271 ,  G01N21/9501 ,  G03F7/70625

Abstract: Provided is an optical measurement system. The optical measurement system includes: an optical module which includes an optical system and which is configured to illuminate a sample and register a defocused image of a nanostructured surface of the sample, an optical system parameter control module configured to set optical parameters of the optical system, an optical transfer function (OTF) measurement module configured to measure an OTF, a defocused image calculation module configured to calculate the defocused image based on the measured OTF and the optical parameters, and a critical dimension (CD) evaluation module configured to compare the registered defocused image with the calculated defocused image of the nanostructured surface of the sample and to output a CD value of the nanostructured surface.