公开(公告)号：US08890069B2

公开(公告)日：2014-11-18

申请号：US14230506

申请日：2014-03-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong-Cheon Sun ,  Hyung-Seop Kim ,  Hee-Won Sunwoo ,  Byoung-Ho Lee ,  Dong-Chul Ihm ,  Soo-Bok Chin

IPC: H01J37/153 ,  G01N23/203 ,  G01N23/225 ,  H01J37/26

CPC classification number: G01N23/2251 ,  G01N2223/611 ,  G01N2223/6462 ,  H01J37/26 ,  H01J37/3178

Abstract: A method for detecting defects includes irradiating at least one electron beam into a first region of a substrate, irradiating at least one electron beam into a second region electrically connected to the first region, and detecting secondary electrons emitted from the second region. The electron beam irradiated into the first region may be the same or different from the electron beam irradiated into the second region. Alternatively, different beams may be simultaneously irradiated into the first and second regions. An image generated based on the secondary electrons shows a defect in the substrate as a region having a grayscale difference with other regions in the image.

Abstract translation: 一种用于检测缺陷的方法包括将至少一个电子束照射到衬底的第一区域中，将至少一个电子束照射到与第一区域电连接的第二区域中，以及检测从第二区域发射的二次电子。 照射到第一区域的电子束可以与照射到第二区域的电子束相同或不同。 或者，可以将不同的光束同时照射到第一和第二区域中。 基于二次电子产生的图像在基板中显示出与图像中的其它区域具有灰度差的区域的缺陷。