公开(公告)号：US08890069B2

公开(公告)日：2014-11-18

申请号：US14230506

申请日：2014-03-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong-Cheon Sun ,  Hyung-Seop Kim ,  Hee-Won Sunwoo ,  Byoung-Ho Lee ,  Dong-Chul Ihm ,  Soo-Bok Chin

IPC: H01J37/153 ,  G01N23/203 ,  G01N23/225 ,  H01J37/26

CPC classification number: G01N23/2251 ,  G01N2223/611 ,  G01N2223/6462 ,  H01J37/26 ,  H01J37/3178

Abstract: A method for detecting defects includes irradiating at least one electron beam into a first region of a substrate, irradiating at least one electron beam into a second region electrically connected to the first region, and detecting secondary electrons emitted from the second region. The electron beam irradiated into the first region may be the same or different from the electron beam irradiated into the second region. Alternatively, different beams may be simultaneously irradiated into the first and second regions. An image generated based on the secondary electrons shows a defect in the substrate as a region having a grayscale difference with other regions in the image.

Abstract translation: 一种用于检测缺陷的方法包括将至少一个电子束照射到衬底的第一区域中，将至少一个电子束照射到与第一区域电连接的第二区域中，以及检测从第二区域发射的二次电子。 照射到第一区域的电子束可以与照射到第二区域的电子束相同或不同。 或者，可以将不同的光束同时照射到第一和第二区域中。 基于二次电子产生的图像在基板中显示出与图像中的其它区域具有灰度差的区域的缺陷。

公开(公告)号：US20140268170A1

公开(公告)日：2014-09-18

申请号：US14101741

申请日：2013-12-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong-Cheon Sun ,  Jeong-Ho Ahn ,  Dong-Ryul Lee ,  Dong-Chul Ihm

IPC: G01B11/22

CPC classification number: G01N21/9505

Abstract: Provided are an apparatus and a method for estimating a depth of a buried defect in a substrate. The apparatus for estimating a depth of a buried defect in a substrate includes a light source providing a source of light, an aperture through which only a part of the source of light passes, a reflecting mirror receiving and reflecting the source of light that has passed through the aperture as a first light, a lens receiving and condensing the first light, the substrate receiving and reflecting the condensed first light as a second light, a light sensor receiving the second light and sensing a brightness of the second light, and a position adjustment portion adjusting a distance between the lens and the substrate.

Abstract translation: 提供了一种用于估计衬底中的埋入缺陷的深度的装置和方法。 用于估计衬底中的埋入缺陷的深度的装置包括提供光源的光源，光源只有一部分通过的孔，反射已经通过的光源的反射镜 通过作为第一光的光圈，接收和聚光第一光的透镜，接收并反射作为第二光的聚集的第一光的基板，接收第二光并感测第二光的亮度的光传感器，以及位置 调节部分调整透镜和基板之间的距离。