公开(公告)号：US20170053773A1

公开(公告)日：2017-02-23

申请号：US15157407

申请日：2016-05-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Rae-Won YI ,  Byoung-Sup AHN ,  Dong-Gun LEE ,  Su-Young LEE

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/023 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/24578

Abstract: An exposure apparatus comprising, a stage configured to receive a substrate, a mark array disposed on the stage and comprising a first mark and a second mark separated from each other by a first distance, a first beam irradiator configured to irradiate a first beam to the first mark, a second beam irradiator being separated from the first beam by a pitch greater than the first distance and configured to irradiate a second beam to the second mark, a detector disposed over the mark array and configured to receive a third beam reflected by the first mark and a fourth beam reflected by the second mark, and a controller configured to control the position of the stage using an output of the detector.

Abstract translation: 一种曝光装置，包括：被配置为接收基板的台，设置在所述台上的标记阵列，并且包括彼此分开第一距离的第一标记和第二标记;第一光束照射器，被配置为将第一光束照射到 第一标记，第二光束照射器，其与所述第一光束分开大于所述第一距离的间距，并被配置为将第二光束照射到所述第二标记;设置在所述标记阵列上方并被配置为接收由所述第一标记阵列反射的第三光束的检测器; 第一标记和由第二标记反射的第四光束，以及控制器，被配置为使用检测器的输出来控制舞台的位置。