RESISTIVE MEMORY DEVICE
    1.
    发明申请

    公开(公告)号:US20220406844A1

    公开(公告)日:2022-12-22

    申请号:US17568866

    申请日:2022-01-05

    Abstract: A resistive memory device including a resistive memory pattern; and a selection element pattern electrically connected to the resistive memory pattern, the selection element pattern including a chalcogenide switching material and at least one metallic material, the chalcogenide switching material including germanium, arsenic, and selenium, and the at least one metallic material including aluminum, strontium, or indium, wherein the selection element pattern includes an inhomogeneous material layer in which content of the at least one metallic material in the selection element pattern is variable according to a position within the selection element pattern.

    ORGANIC PHOTOELECTRONIC DEVICES AND IMAGE SENSORS INCLUDING THE SAME
    2.
    发明申请
    ORGANIC PHOTOELECTRONIC DEVICES AND IMAGE SENSORS INCLUDING THE SAME 审中-公开
    有机光电器件和包括其的图像传感器

    公开(公告)号:US20160197122A1

    公开(公告)日:2016-07-07

    申请号:US14794532

    申请日:2015-07-08

    CPC classification number: H01L27/307 H01L51/107 H01L2251/303

    Abstract: Organic photoelectronic devices and image sensors including the organic photoelectronic devices, include a first light-transmitting electrode at a side where light enters, a second light-transmitting electrode opposite to the first light-transmitting electrode, an active layer between the first and second light-transmitting electrodes, and an ultraviolet (UV) ray blocking layer on the first light-transmitting electrode, wherein the ultraviolet (UV) ray blocking layer includes at least one metal oxide having a light transmittance of less than or equal to about 75% for light of less than or equal to about 380 nm.

    Abstract translation: 包括有机光电子器件的有机光电子器件和图像传感器包括在光入射侧的第一透光电极,与第一透光电极相对的第二透光电极,在第一和第二光之间的有源层 - 透射电极和在第一透光电极上的紫外(UV)光线阻挡层,其中紫外线(UV)光线阻挡层包括至少一种具有小于或等于约75%的透光率的金属氧化物,用于 小于或等于约380nm的光。

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