公开(公告)号：US20180284599A1

公开(公告)日：2018-10-04

申请号：US15627916

申请日：2017-06-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwan-chul JEON ,  Mun Ja KIM ,  Sung-won KWON ,  Hee-bom KIM ,  Chang-young JEONG

IPC: G03F1/64 ,  G03F1/22

CPC classification number: G03F1/64 ,  G03F1/22 ,  G03F1/24 ,  G03F1/62 ,  G03F7/2008

Abstract: Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.

公开(公告)号：US20150131071A1

公开(公告)日：2015-05-14

申请号：US14534340

申请日：2014-11-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong-wan KIM ,  Seong-sue KIM ,  Chang-young JEONG ,  Dong-gun LEE

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/673 ,  H01L21/683

CPC classification number: G03F7/70741 ,  G03F1/142 ,  G03F1/64 ,  G03F7/707 ,  G03F7/70983 ,  H01L21/67359

Abstract: A semiconductor device manufacturing apparatus includes a mask stage including a mask holder system that fixes a photomask, the mask holder system having a first fixing portion mounted at a first position of the mask holder system to fix the photomask, and a second fixing portion at a second position of the mask holder system and spaced apart from the first position, the second fixing portion fixing a pellicle assembly to be spaced apart from the photomask on the first fixing portion.

Abstract translation: 半导体器件制造装置包括掩模台，其包括固定光掩模的掩模保持器系统，所述掩模保持器系统具有安装在所述掩模保持器系统的第一位置处的第一固定部分以固定所述光掩模;以及第二固定部， 所述第二固定部分固定在所述第一固定部分上与所述光掩模间隔开的防护薄膜组件。