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公开(公告)号：US20190384163A1
公开(公告)日：2019-12-19
申请号：US16214781
申请日：2018-12-10
发明人： Mun Ja KIM , Changyoung Jeong
IPC分类号： G03F1/62
摘要： A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane includes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.
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2.发明申请公开(公告)号：US20180259847A1
公开(公告)日：2018-09-13
申请号：US15977283
申请日：2018-05-11
发明人： Mun Ja KIM , Ji-beom YOO , Seul-gi KIM , Sang-jin CHO , Myung-shik CHANG , Jang-dong YOU
摘要： A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
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3.发明申请公开(公告)号：US20180284599A1
公开(公告)日：2018-10-04
申请号：US15627916
申请日：2017-06-20
发明人： Hwan-chul JEON , Mun Ja KIM , Sung-won KWON , Hee-bom KIM , Chang-young JEONG
CPC分类号： G03F1/64 , G03F1/22 , G03F1/24 , G03F1/62 , G03F7/2008
摘要： Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.
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公开(公告)号：US20230399552A1
公开(公告)日：2023-12-14
申请号：US18236515
申请日：2023-08-22
发明人： Mun Ja KIM , Changyoung JEONG
IPC分类号： C09J129/04 , C09J11/06 , C09J11/04 , G03F1/64 , C09J179/02
CPC分类号： C09J129/04 , C09J11/06 , C09J11/04 , G03F1/64 , C09J179/02 , C08K3/36
摘要： An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water.
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公开(公告)号：US20180130714A1
公开(公告)日：2018-05-10
申请号：US15609284
申请日：2017-05-31
发明人： Eokbong KIM , Jin sung CHOI , Mun Ja KIM , Kijung SON
IPC分类号： H01L21/66 , H01L21/027 , G03F1/62
摘要： A reticle may be fabricated and inspected. The reticle, which may include thin patterns, may be selectively incorporated into a fabricated semiconductor device based on measurement information generated based on the inspecting. The inspecting may include forming thin patterns on a substrate, forming a first discharge layer on the thin patterns, and directing a first charged particle beam to the substrate, such that the first charged particle beam passes through the first discharge layer. Measurement information may be generated based on the first charged particle beam. The first discharge layer may connect the thin patterns to each other and may be separated from the substrate between the thin patterns.
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6.发明申请APPARATUS GENERATING EXTREME ULTRAVIOLET LIGHT AND EXPOSURE SYSTEM INCLUDING THE SAME 审中-公开产生超极紫外光的装置包括其中的光和曝光系统公开(公告)号：US20170031142A1
公开(公告)日：2017-02-02
申请号：US15183015
申请日：2016-06-15
发明人： Eokbong KIM , Mun Ja KIM , Jongju PARK , Donggun LEE , Byunggook KIM
CPC分类号： G02B19/0095 , G02B5/003 , G02B19/0023 , G03F7/70033 , G03F7/70916 , G21K1/062 , G21K1/10 , H05G2/001
摘要： An extreme ultraviolet (EUV) light generation apparatus includes a source supplying unit in a chamber, the source supplying unit including a source material for generation of extreme ultraviolet light, a plasma generator to generate plasma from the source material, an optical unit in the chamber, and at least one protection film adjacent to the optical unit, the at least one protection film including at least one of graphite or graphene.
摘要翻译： 一种极紫外（EUV）光产生装置包括：室中的源供给单元，源供给单元，包括用于产生极紫外光的源材料;等离子体发生器，用于从源材料产生等离子体;室中的光学单元; 以及与光学单元相邻的至少一个保护膜，所述至少一个保护膜包括石墨或石墨烯中的至少一个。
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7.发明申请公开(公告)号：US20220100076A1
公开(公告)日：2022-03-31
申请号：US17211165
申请日：2021-03-24
发明人： Byungchul YOO , Sunghoon PARK , Mun Ja KIM
IPC分类号： G03F1/22
摘要： A stud attachment device for attaching a plurality of studs to a photomask constituting a reticle. The stud attachment device including a body; a plurality of holders extending from the body, the holders allowing the studs to be laid thereon, respectively; and a pressure regulator for independently controlling pressures of the holders when the studs are attached to the photomask.
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公开(公告)号：US20200341364A1
公开(公告)日：2020-10-29
申请号：US16598180
申请日：2019-10-10
发明人： Mun Ja KIM , Seulgi Kim , Kibong NAM , Jinho YEO , Jibeom YOO
IPC分类号： G03F1/64
摘要： Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.
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公开(公告)号：US20190390090A1
公开(公告)日：2019-12-26
申请号：US16364847
申请日：2019-03-26
发明人： Mun Ja KIM , Changyoung JEONG
IPC分类号： C09J129/04 , C09J11/06 , C09J11/04 , C09J179/02 , G03F1/64
摘要： An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water.
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10.发明申请PELLICLE FILM INCLUDING GRAPHITE-CONTAINING THIN FILM FOR EXTREME ULTRAVIOLET LITHOGRAPHY 有权薄膜包括用于极端超紫外光刻的含石墨的薄膜公开(公告)号：US20160282712A1
公开(公告)日：2016-09-29
申请号：US15034014
申请日：2014-06-03
申请人： SAMSUNG ELECTRONICS CO., LTD. , RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY , FINE SEMITECH CORP.
发明人： Mun Ja KIM , Ji-beom YOO , Seul-gi KIM , Sang-jin CHO , Myung-shik CHANG , Jang-dong YOU
摘要： A pellicle film for extreme ultraviolet (EUV) lithography includes graphite-containing thin film.
摘要翻译： 用于极紫外（EUV）光刻的防护薄膜包括含石墨的薄膜。
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